Hexahydro-2H-3,6-methanocyclopenta[b]furan-2-one | 6402-53-5

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: Hexahydro-2H-3,6-methanocyclopenta[b]furan-2-one
• 英文别名: 5-oxatricyclo[4.3.0.03,7]nonan-4-one
• CAS: 6402-53-5
• 化学式: C₈H₁₀O₂
• 分子量: 138.16
• InChiKey: JVUUYLXVTAUATF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.1
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer
  申请人：Central Glass Company, Limited

  公开号：US20150361026A1

  公开（公告）日：2015-12-17

  As shown by the following reaction formula, disclosed is a fluorine-containing hydroxyaldehyde production method, including the step of obtaining a fluorine-containing hydroxyaldehyde represented by the general formula (1) by reacting a fluorine-containing ketone represented by the general formula (4) and an aldehyde represented by the general formula (5) in the presence of an organic base selected from a heterocyclic compound which contains a nitrogen atom in its ring or a tertiary amine. By this production method, it is possible to obtain the fluorine-containing hydroxyaldehyde in a high yield. Furthermore, it is possible to easily obtain in high yields a fluorine-containing propanediol, which is a derivative of this fluorine-containing hydroxyaldehyde, and a fluorine-containing alcohol monomer by using the same.

  根据以下反应方程式，揭示了一种含氟羟基醛的生产方法，包括通过在选择的含氟酮（通式（4）表示）和醛（通式（5）表示）在含有从含有氮原子的杂环化合物或三级胺中选择的有机碱的情况下反应，获得由通式（1）表示的含氟羟基醛的步骤。通过这种生产方法，可以高产率地获得含氟羟基醛。此外，可以通过使用相同方法轻松高产率地获得含氟丙二醇（这是这种含氟羟基醛的衍生物）和含氟醇单体。
• HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20160238930A1

  公开（公告）日：2016-08-18

  A polymer for resist use is obtainable from a hemiacetal compound having formula (1 a ) wherein R 1 is H, CH 3 or CF 3 , R 2 to R 4 each are H or a monovalent hydrocarbon group, X 1 is a divalent hydrocarbon group, ZZ designates a non-aromatic mono- or polycyclic ring of 4 to 20 carbon atoms having a hemiacetal structure, k 1 =0 or 1, and k 2 =0 to 3. A resist composition comprising the polymer displays controlled acid diffusion and low roughness during both positive and negative tone developments.

  从具有以下式（1a）的半缩醛化合物获得用于抗蚀的聚合物，其中R1为H、CH3或CF3，R2至R4分别为H或单价碳氢基团，X1为二价碳氢基团，ZZ表示具有半缩醛结构的非芳香性4至20个碳原子的单环或多环环，k1=0或1，k2=0至3。包含该聚合物的抗蚀组合物显示出在正片和负片显影过程中控制酸扩散和低粗糙度。
• SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS
  申请人：OHASHI Masaki

  公开号：US20100143830A1

  公开（公告）日：2010-06-10

  A sulfonium salt has formula (1) wherein R 1 is a monovalent hydrocarbon group except vinyl and isopropenyl, R 2 , R 3 , and R 4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl or may bond together to form a ring with the sulfur atom, and n is 1 to 3. A chemically amplified resist composition comprising the sulfonium salt is capable of forming a fine feature pattern of good profile after development due to high resolution, improved focal latitude, and minimized line width variation and profile degradation upon prolonged PED.

  一种硫铵盐的化学式为（1），其中R1是一种一价碳氢基团，但不包括乙烯基和异丙烯基，R2、R3和R4是烷基、烯基、氧代烷基、芳基、芳基烷基或芳基氧代烷基，或者它们可以相互连接形成与硫原子的环，并且n为1至3。包含该硫铵盐的化学增感抗剂组合物能够由于高分辨率、改善的焦距宽度、以及在长时间PED后最小化线宽变化和剖面降解而形成良好剖面的精细特征图案。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20150323865A1

  公开（公告）日：2015-11-12

  A polymer for resist use is obtainable from a monomer having formula (1) wherein R 1 is H, CH 3 or CF 3 , R 2 and R 3 each are H or a monovalent hydrocarbon group, X 1 is a divalent hydrocarbon group, k 1 =0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.

  可以从具有式（1）的单体获得用于抗蚀的聚合物，其中R1为H、CH3或CF3，R2和R3各自为H或一价碳氢基团，X1为二价碳氢基团，k1=0或1，Z形成5或6元脂环。包含该聚合物的抗蚀组合物具有货架稳定性，显示高溶解对比度，控制酸扩散和低粗糙度，在碱性显影和有机溶剂显影过程中表现出色。
• LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20090233242A1

  公开（公告）日：2009-09-17

  Lactone-containing compounds having formula (1) are novel wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are H or monovalent hydrocarbon groups, or R 2 and R 3 may together form an aliphatic hydrocarbon ring, R 4 is H or CO 2 R 5 , R 5 is a monovalent hydrocarbon group, W is CH 2 , O or S, and k 1 is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.

  含有式（1）的内酯化合物是新颖的，其中R1为H、F、甲基或三氟甲基，R2和R3为H或一价碳氢基团，或R2和R3可以共同形成脂肪烃环，R4为H或CO2R5，R5为一价碳氢基团，W为CH2、O或S，k1为3、4或5。它们可用作单体以生产对辐射≦500纳米透明的聚合物。包含这些聚合物作为基础树脂的辐射敏感抗蚀组合物表现出优异的性能，包括分辨率、LER、图案密度依赖性和曝光余量。