tricyclo[5.2.1.02,6]decan-8-ylethaneenyl ether | 430437-08-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: tricyclo[5.2.1.02,6]decan-8-ylethaneenyl ether
• 英文别名: tricyclo[5.2.1.02,6]decan-8-yl ethenyl ether；8-tricyclo[5.2.1.0(2,6)]decanyl vinyl ether；tricyclo[5.2.1.02,6]decane-8-yl vinyl ether；tricyclo[5.2.1.02,6]decan-8-ylvinylether；8-ethenoxytricyclo[5.2.1.02,6]decane；8-vinyloxytricyclo[5.2.1.02,6]decane；5-(Ethenyloxy)octahydro-1H-4,7-methanoindene
• CAS: 430437-08-4
• 化学式: C₁₂H₁₈O
• 分子量: 178.274
• InChiKey: PKTORKCIXKNVFR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER
  申请人：Momose Hikaru

  公开号：US20090198065A1

  公开（公告）日：2009-08-06

  To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n≧3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; K 1 and K 2 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; L 1 and L 2 each represent at least one selected from —C(O)O—, —C(O)— and —OC(O)—; M 1 , M 2 and M 3 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Y 1 and Y 2 each represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, and m3 each represent 0 or 1; and R 1 represents H or a methyl group.

  提供一种抗蚀聚合物，其由一个具有结构式（1）或（2）所表示的酸分解单元作为结构单元，能够在DUV准分子激光微影或类似工艺中表现出小的线边粗糙度并产生少量缺陷。在式（1）和（2）中，n表示2至24的整数；J表示单键或二价碳氢基团，当n=2时可以具有取代基/杂原子，或者当n≥3时可以表示n价碳氢基团，可以具有取代基/杂原子；E表示聚合终止剂、链转移剂或聚合引发剂的残基；K1和K2分别表示至少选择自烷基、环烷基、氧烷基、芳烃、二价噻唑环、二价噁唑环和二价咪唑环中的至少一种；L1和L2分别表示至少选择自—C（O）O—、—C（O）—和—OC（O）—中的至少一种；M1、M2和M3分别表示至少选择自烷基、环烷基、氧烷基和芳烃中的至少一种；Y、Y1和Y2分别表示酸分解键；k1、k2、l1、l2、m1、m2和m3分别表示0或1；R1表示H或甲基基团。
• PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION
  申请人：Thackeray James W.

  公开号：US20120129105A1

  公开（公告）日：2012-05-24

  A copolymer has formula: wherein R 1 -R 5 are independently H, C 1-6 alkyl, or C 4-6 aryl, R 6 is a fluorinated or non-fluorinated C 5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C 6-20 aryl group; each R 7 and R 8 is —OR 11 or —C(CF 3 ) 2 OR 11 where each R 11 is H, a fluorinated or non-fluorinated C 5-30 acid decomposable group, or a combination; each R 9 is independently F, a C 1-10 alkyl, C 1-10 fluoroalkyl, C 1-10 alkoxy, or a C 1-10 fluoroalkoxy group; R 10 is a cation-bound C 10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.

  一种共聚物的化学式为：其中R1-R5独立地为H、C1-6烷基或C4-6芳基，R6为氟化或非氟化的C5-30酸分解基团；每个Ar为单环、多环或融合多环的C6-20芳基基团；每个R7和R8为—OR11或—C(CF3)2OR11，其中每个R11为H、氟化或非氟化的C5-30酸分解基团或其组合；每个R9独立地为F、C1-10烷基、C1-10氟烷基、C1-10烷氧基或C1-10氟烷氧基基团；R10为带正离子的C10-40光酸发生剂含基团，摩尔分数a、b和d为0至0.80，c为0.01至0.80，e为0至0.50，其中若a、b和d为0，则e大于0，a+b+c+d+e之和为1，l和m为1至4的整数，n为0至5的整数。一种光刻胶和涂层基板，均包括该共聚物。
• Photosensitive copolymer and photoresist composition
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：EP2455812A2

  公开（公告）日：2012-05-23

  A copolymer has the formula: wherein R1-R5 are each independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is independently a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each of R7 and R8 is independently -OR11 or a - C(CF3)2OR11 group where each occurrence of R11 is independently H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination of these; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are independently 0 to 0.80, mole fraction c is 0.01 to 0.80, e is 0 to 0.50 provided that where a, b, and d are 0, e is greater than 0, the sum of the mole fractions a+b+c+d+e is 1, 1 and m are independently integers of 1 to 4, and n is an integer of 0 to 5. A photoresist, and a coated substrate, each also include the copolymer.

  共聚物的分子式为 其中R1-R5各自独立地为H、C1-6烷基或C4-6芳基，R6为氟化或非氟化C5-30可酸分解基团；每个Ar独立地为单环、多环或融合多环C6-20芳基；R7和R8各自独立地为-OR11或-C(CF3)2OR11基团，其中R11的每个出现独立地为H、氟化或非氟化C5-30可酸分解基团或它们的组合；每个 R9 独立地是 F、C1-10 烷基、C1-10 氟烷基、C1-10 烷氧基或 C1-10 氟烷氧基； R10 是含阳离子的 C10-40 光酸发生器基团，摩尔分数 a、b 和 d 独立地为 0 至 0.80，摩尔分数 c 为 0.01 至 0.80，e 为 0 至 0.50，条件是其中 a、b 和 d 为 0，e 大于 0，摩尔分数 a+b+c+d+e 之和为 1，1 和 m 独立地为 1 至 4 的整数，n 为 0 至 5 的整数。光致抗蚀剂和涂层基底也分别包括共聚物。
• HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING SAME, AND COMPOSITION
  申请人：A School Corporation Kansai University

  公开号：EP3190138A1

  公开（公告）日：2017-07-12

  Provided is a hyperbranched polymer having such a backbone that is readily decomposable by an acid. The hyperbranched polymer is derived from, via reaction, monomers including a monomer (X) and a monomer (Y). The monomer (X) contains three or more hydroxy groups per molecule. The monomer (Y) contains two or more groups represented by General Formula (y) per molecule. The monomer (X) includes at least one compound selected from the group consisting of cyclodextrins, compounds represented by General Formula (I), pillararenes, compounds represented by General Formula (II), compounds represented by General Formula (III), and compounds represented by General Formula (IV). The monomer (Y) includes a compound represented by General Formula (1). General Formulae (y), (I), (II), (III), (IV), and (1) are expressed as follows:

  本发明提供了一种超支化聚合物，该聚合物具有这样的骨架，可被酸分解。这种超支化聚合物是由单体（X）和单体（Y）反应生成的。单体（X）每个分子含有三个或更多羟基。单体（Y）每个分子含有两个或多个通式（y）所代表的基团。单体（X）包括至少一种选自以下组别的化合物：环糊精、通式（I）所代表的化合物、支柱烯类、通式（II）所代表的化合物、通式（III）所代表的化合物和通式（IV）所代表的化合物。单体（Y）包括通式（1）所代表的化合物。通式(y)、(I)、(II)、(III)、(IV)和(1)表示如下：
• Liquid developer and method of producing same
  申请人：CANON KABUSHIKI KAISHA

  公开号：US10175597B2

  公开（公告）日：2019-01-08

  Provided is a liquid developer that gives a high image density, has a high resistance, suppresses the appearance of image blurring, can be reused, is readily cured by ultraviolet radiation, and can accommodate higher process speeds. This liquid developer contains a carrier liquid, a toner particle insoluble in the carrier liquid, and a compound with the following formula (1) [In formula (1), R1 and R2 each independently represent an alkyl group having at least 13 and not more than 23 carbons.].

  本发明提供了一种液体显影剂，它具有高图像密度、高耐受性、抑制图像模糊、可重复使用、易于通过紫外线辐射固化以及可适应更高的加工速度。这种液体显影剂含有载液、不溶于载液的墨粉颗粒和下式（1）的化合物 [在式 (1) 中，R1 和 R2 各自独立地代表一个至少有 13 个碳原子但不超过 23 个碳原子的烷基。］