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1-(1-Methoxyethoxy)adamantane | 1402544-41-5

中文名称
——
中文别名
——
英文名称
1-(1-Methoxyethoxy)adamantane
英文别名
——
1-(1-Methoxyethoxy)adamantane化学式
CAS
1402544-41-5
化学式
C13H22O2
mdl
——
分子量
210.316
InChiKey
BVMLKPCDCHXHER-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.1
  • 重原子数:
    15
  • 可旋转键数:
    3
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    18.5
  • 氢给体数:
    0
  • 氢受体数:
    2

反应信息

  • 作为反应物:
    描述:
    1-(1-Methoxyethoxy)adamantane叔丁基氯化镁2,4,6-三甲基吡啶三氟甲磺酸三甲基硅酯copper(l) iodide 作用下, 以 四氢呋喃 为溶剂, 反应 2.5h, 以83%的产率得到1-(3,3-Dimethylbutan-2-yloxy)adamantane
    参考文献:
    名称:
    一种由甲氧基甲基醚合成烷基醚的温和多功能方法及其在立体拥挤醚的制备中的应用
    摘要:
    通过吡啶鎓盐类中间体,从甲氧基甲基(MOM)和甲氧基乙基(ME)醚衍生物合成烷基醚的温和而多样化的路线已被开发出来。向盐中添加有机铜盐即使在对酸或碱敏感的官能团存在的情况下,也能以高收率获得相应的烷基醚,包括高度拥挤的烷基醚。
    DOI:
    10.1002/adsc.201200290
  • 作为产物:
    描述:
    二甲氧基乙烷1-金刚烷醇2,4,6-三甲基吡啶三氟甲磺酸三甲基硅酯 作用下, 以 二氯甲烷 为溶剂, 反应 0.5h, 以86%的产率得到1-(1-Methoxyethoxy)adamantane
    参考文献:
    名称:
    一种由甲氧基甲基醚合成烷基醚的温和多功能方法及其在立体拥挤醚的制备中的应用
    摘要:
    通过吡啶鎓盐类中间体,从甲氧基甲基(MOM)和甲氧基乙基(ME)醚衍生物合成烷基醚的温和而多样化的路线已被开发出来。向盐中添加有机铜盐即使在对酸或碱敏感的官能团存在的情况下,也能以高收率获得相应的烷基醚,包括高度拥挤的烷基醚。
    DOI:
    10.1002/adsc.201200290
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文献信息

  • PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
    申请人:ICHIKAWA Koji
    公开号:US20120270153A1
    公开(公告)日:2012-10-25
    A photoresist composition comprising (A) a resin which has an acid-labile group-containing structural unit and a lactone ring-containing structural unit, and (B) a salt represented by formula (I): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, L 1 represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, provided that L 1 is not a single bond when n is 0, R 1 represents a hydroxy group or a hydroxy group protected by a protecting group, and Z + represents an organic cation.
    一种包括(A)具有含酸敏感基团结构单元和含内酯环结构单元的树脂,以及(B)由式(I)表示的盐的光刻胶组合物:其中Q1和Q2分别独立表示氟原子或C1-C6全氟烷基基团,n表示0或1,L1表示单键或C1-C10脂肪二基基团,其中亚甲基基团可被氧原子或羰基取代,但当n为0时,L1不是单键,R1表示羟基或被保护基团保护的羟基,Z+表示有机阳离子。
  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
    公开号:US20210371376A1
    公开(公告)日:2021-12-02
    A salt represented by formula (I): wherein R 1 and R 2 each independently represent a hydroxy group, —O—R 10 , —O—CO—O—R 10 or —O-L 1 -CO—O—R 10 ; L 1 represents an alkanediyl group having 1 to 6 carbon atoms; R 4 , R 5 , R 7 and R 8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH 2 — included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO 2 —; R 10 represents an acid-labile group; X 1 and X 2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI − represents an organic anion.
    一种由化学式(I)表示的盐:其中R1和R2分别代表一个羟基,-O-R10,-O-CO-O-R10或-O-L1-CO-O-R10;L1代表具有1至6个碳原子的烷二基基团;R4、R5、R7和R8分别独立地表示卤素原子,具有1至12个碳原子的烷基氟基团或具有1至18个碳原子的碳氢基团,碳氢基团可能有取代基,并且碳氢基团中包含的-CH2-可被-O-,-CO-,-S-或-SO2-取代;R10代表一个酸敏感基团;X1和X2分别独立地表示一个氧原子或一个硫原子;m1表示1至5的整数,m2和m8表示0至5的整数,m4、m5和m7表示0至4的整数;AI-代表一个有机阴离子。
  • SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
    申请人:ANRYU Yukako
    公开号:US20120328986A1
    公开(公告)日:2012-12-27
    A salt represented by formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, L l represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that L l is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, R l represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z + represents an organic cation.
    一种用化学式(I)表示的盐:其中Q1和Q2分别表示氟原子或C1-C6全氟烷基基团,n表示0或1,Ll表示单键或C1-C10脂肪二基团,其中一个亚甲基基团可被氧原子或羰基取代,但当n为0时,Ll不是单键,环W表示C3-C36脂肪环,其中一个亚甲基基团可被氧原子、硫原子、羰基或磺酰基取代,氢原子可被氢氧基、C1-C12烷基基团或C1-C12烷氧基取代,Rl表示氢氧基或受保护的氢氧基,Z+表示有机阳离子。
  • SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
    公开号:US20190112265A1
    公开(公告)日:2019-04-18
    A salt comprising a group represented by the formula (aa): wherein X a and X b independently each represent an oxygen atom or a sulfur atom, and X 1 represents a C1-C12 saturated hydrocarbon group which has a moiety represented by formula (1 a ) or (2 a ):
    一种盐,其由公式(aa)表示的基团组成:其中Xa和Xb分别独立地表示氧原子或硫原子,而X1表示具有由公式(1a)或(2a)表示的基团的C1-C12饱和碳氢基团。
  • SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
    申请人:MASUYAMA Tatsuro
    公开号:US20120315580A1
    公开(公告)日:2012-12-13
    A salt represented by formula (I): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A 1 represents a C1-C30 monovalent organic group, X 1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group, m 1 and m 2 independently each represent an integer of 1 to 4, and Z + represents an organic cation.
    一种由化学式(I)表示的盐:其中Q1和Q2分别独立表示氟原子或C1-C6全氟烷基团,A1表示C1-C30单价有机基团,X1表示C1-C10脂肪烃基团,其中氢原子可能被羟基取代,m1和m2分别独立表示1到4的整数,Z+表示有机阳离子。
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