Methyl 2-(2-chloroacetyl)oxy-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-6-carboxylate | 1189185-41-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: Methyl 2-(2-chloroacetyl)oxy-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-6-carboxylate
• CAS: 1189185-41-8
• 化学式: C₁₂H₁₃ClO₆
• 分子量: 288.685
• InChiKey: FZQYNYCHCGYWKF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  19
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  78.9
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound
  申请人：Fujifilm Corporation

  公开号：EP2468742A1

  公开（公告）日：2012-06-27

  An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the solubility of the resin in an alkali developer being increased by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation. The repeating unit having the group represented by formula (1) being derived from a polymerizable compound represented by formula (M-1) as defined in the specification.

  本发明提供了一种对辐射线敏感或辐射敏感的树脂组合物和一种使用该组合物的图案形成方法，该组合物包括(A)一种含有重复单元的树脂，该重复单元具有如说明书中所定义的式(1)所代表的基团，该树脂在碱显影剂中的溶解度在酸的作用下增加，和(B)一种在辐射线或辐射照射下能产生酸的化合物。具有式(1)所代表基团的重复单元来自于说明书中定义的式(M-1)所代表的可聚合化合物。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND
  申请人：YAMAGUCHI Shuhei

  公开号：US20090246695A1

  公开（公告）日：2009-10-01

  An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.