1-bicyclo[2.2.1]hept-2-yl-2-methyl-propan-2-ol | 1245617-76-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 1-bicyclo[2.2.1]hept-2-yl-2-methyl-propan-2-ol
• 英文别名: 1-(Bicyclo[2.2.1]heptan-2-yl)-2-methylpropan-2-ol；1-(2-bicyclo[2.2.1]heptanyl)-2-methylpropan-2-ol
• CAS: 1245617-76-8
• 化学式: C₁₁H₂₀O
• 分子量: 168.279
• InChiKey: LQAHAGBEQANRSL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• [EN] 1,1-(Dimethyl-Ethylamino)-2-Hydroxy-Propoxy]-Ethyl}-3-Methyl-Biphenyl-4- Carboxylic Acid Derivatives As Calcium Receptor Antagonists<br/>[FR] DÉRIVÉS DE L'ACIDE 1,1-(DIMÉTHYL-ÉTHYLAMINO)-2-HYDROXY-PROPOXY]-ÉTHYL}-3-MÉTHYL-BIPHÉNYL-4-CARBOXYLIQUE UTILES EN TANT QU'ANTAGONISTES DES RÉCEPTEURS DU CALCIUM
  申请人：PFIZER

  公开号：WO2010103429A1

  公开（公告）日：2010-09-16

  The present invention is directed to novel 1,1 -(dimethyl-ethylamino)-2- hydroxy-propoxy]-ethyl}-3-methyl-biphenyl-4-carboxylic acid derivatives and pharmaceutically acceptable salts thereof of structural formula I wherein the variable R1 is as described herein. Also provided are pharmaceutical compositions comprising the compounds of formula I as well as methods of treatment employing compounds of formula I to treat a disease or disorder characterized by abnormal bone or mineral homeostasis such as hypoparathyroidism, osteoporosis, osteopenia, periodontal disease, Paget's disease, bone fracture, osteoarthritis, rheumatoid arthritis, and humoral hypercalcemia of malignancy.

  本发明涉及新颖的1,1-(二甲基乙基氨基)-2-羟基-丙氧基]-乙基}-3-甲基联苯基-4-羧酸衍生物及其结构式I中的药用盐，其中变量R1如本文所述。还提供了包含结构式I化合物的药物组合物，以及利用结构式I化合物治疗由异常骨骼或矿物质稳态特征的疾病或紊乱的方法，如甲状旁腺功能减退症、骨质疏松症、骨质疏松症、牙周病、帕吉特病、骨折、骨关节炎、类风湿性关节炎和恶性高钙血症。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140045123A1

  公开（公告）日：2014-02-13

  A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.

  一种聚合物，包括由具有支链烷基的萜酸酯单体衍生的重复单元，用于形成抗蚀组合物。在经过曝光、PEB和有机溶剂显影处理后，抗蚀组合物在溶解对比度方面得到改善。
• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。
• Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same
  申请人：Central Glass Company, Limited

  公开号：US20150198879A1

  公开（公告）日：2015-07-16

  Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R 01 represents a hydrogen atom or a monovalent organic group, and M + represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

  本公开了一种含氟磺酸盐树脂，其具有以下通用式（3）所代表的重复单元。在该式中，每个A独立地表示氢原子、氟原子或三氟甲基基团，n表示1-10的整数。W表示二价连接基团，R01表示氢原子或一价有机基团，M+表示一价阳离子。含有该树脂的抗蚀组合物在感光性、分辨率和掩膜图案的重现性方面更加优越，并且能够形成具有较低LER的图案。
• NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Sagehashi Masayoshi

  公开号：US20120183904A1

  公开（公告）日：2012-07-19

  A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.

  一种化学增感正向光阻组合物可以使用具有淬灭剂的聚合物制备，具体来说，该聚合物包含具有碳酸酯结构的重复单元，该碳酸酯结构在酸的作用下分解生成氨基团，并且可以包含具有酸敏感基团的重复单元，该酸敏感基团在酸的作用下能够生成羧基和/或羟基团。该聚合物对于抑制酸的扩散非常有效，并且本身扩散很少，组合物形成高分辨率的矩形剖面图案。