3,5-bis(hexafluoro-2-hydroxy-2-propyl)cyclohexyl vinyl ether | 691410-53-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 3,5-bis(hexafluoro-2-hydroxy-2-propyl)cyclohexyl vinyl ether
• 英文别名: 1,1'-[5-(Vinyloxy)cyclohexane-1,3-diyl]bis[2,2,2-trifluoro-1-(trifluoromethyl)ethanol]；2-[3-ethenoxy-5-(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)cyclohexyl]-1,1,1,3,3,3-hexafluoropropan-2-ol
• CAS: 691410-53-4
• 化学式: C₁₄H₁₄F₁₂O₃
• 分子量: 458.244
• InChiKey: OWVBAZCWSQOYCM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  29
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  49.7
• 氢给体数：
  2
• 氢受体数：
  15

文献信息

• CALIXARENE COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20130157195A1

  公开（公告）日：2013-06-20

  A molecular glass compound includes (A) a tetrameric reaction product of a specific aromatic compound having at least one hydroxy group, and a specific polycyclic or fused polycyclic aromatic aldehyde; and (B) an acid-removable protecting group as an adduct with the hydroxy group of the aromatic compound and/or a hydroxy group of the polycyclic or fused polycyclic aromatic aldehyde. A photoresist composition including the molecular glass compound, and a coated substrate including a layer of the photoresist composition are also disclosed.

  一种分子玻璃化合物，包括(A)一种特定芳香化合物的四聚反应产物，该芳香化合物至少具有一个羟基，以及一种特定的多环或融合多环芳香醛；和(B)一种酸可移除的保护基，作为与芳香化合物的羟基和/或多环或融合多环芳香醛的羟基的加合物。还公开了一种包括该分子玻璃化合物的光刻胶组合物，以及包括光刻胶组合物层的涂覆基板。
• Negative resist composition and patterning process using the same
  申请人：Hatakeyama Jun

  公开号：US20080020290A1

  公开（公告）日：2008-01-24

  There is disclosed a negative resist composition comprising, at least, a polymer comprising a repeating unit of hydroxy vinylnaphthalene represented by the following general formula (1). There can be provided a negative resist composition, in particular, a chemically amplified negative resist composition that can exhibit higher resolution than conventional hydroxy styrene or novolac negative resist compositions, that provides excellent pattern profiles after being exposed and that exhibits excellent etching resistance; and a patterning process that uses the resist composition.
• METHOD FOR USING A TOPCOAT COMPOSITION
  申请人：Ito Hiroshi

  公开号：US20090142714A1

  公开（公告）日：2009-06-04

  A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.
• US7402626B2
  申请人：——

  公开号：US7402626B2

  公开（公告）日：2008-07-22
• US7473749B2
  申请人：——

  公开号：US7473749B2

  公开（公告）日：2009-01-06