N-[(5-methyl-5-carboxymethylbicyclo[2.2.1]hept-2-yl)sulfonyloxy]succinimide | 353275-43-1

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: N-[(5-methyl-5-carboxymethylbicyclo[2.2.1]hept-2-yl)sulfonyloxy]succinimide
• 英文别名: N-[(5-methyl-5-carboxymethylbicyclo[2.2.1]heptan-2-yl)sulfonyloxy]succinimide；2-[5-(2,5-Dioxopyrrolidin-1-yl)oxysulfonyl-2-methyl-2-bicyclo[2.2.1]heptanyl]acetic acid
• CAS: 353275-43-1
• 化学式: C₁₄H₁₉NO₇S
• 分子量: 345.373
• InChiKey: VLSXSDQKIHYGKU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.1
• 重原子数：
  23
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.79
• 拓扑面积：
  126
• 氢给体数：
  1
• 氢受体数：
  7

文献信息

• Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions
  申请人：Miyamatsu Takashi

  公开号：US20060141383A1

  公开（公告）日：2006-06-29

  A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R 1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR 3 group, wherein R 3 is a monovalent alicyclic hydrocarbon group, R 2 represents a (substituted)-alkyl group or two or more R 2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X − indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

  一种亚砜盐化合物，在波长为220纳米或更短的深紫外线下具有优异的透明度，当用作光酸发生剂时，表现出良好的性能平衡，如灵敏度、分辨率、图案形态、LER和储存稳定性。该光酸发生剂包含亚砜盐化合物，且包含该光酸发生剂的正电调辐射敏感树脂组成物。该亚砜盐化合物由以下公式(I)表示，其中R1表示卤素原子、烷基、一价脂环烃基、烷氧基或-OR3基，其中R3为一价脂环烃基，R2表示(取代)-烷基或两个或更多的R2基形成环状结构，p为0-7，q为0-6，n为0-3，X-表示磺酸根离子。该正电调辐射敏感树脂组成物包括(A)亚砜盐化合物的光酸发生剂和(B)含酸可解离基团的树脂。
• Onium salt compound and radiation-sensitive resin composition
  申请人：Yoneda Eiji

  公开号：US20050053861A1

  公开（公告）日：2005-03-10

  An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1-10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO 2 R, —O—S(O)R, or —SO 2 R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.

  本发明揭示了一种具有以下式（1）的阳离子部分的醇盐化合物。其中，A代表I或S，m为1或2，n为0或1，x为1-10，Ar1和Ar2为（取代）芳香烃基，P代表-O-SO2R，-O-S（O）R或-SO2R，其中R代表氢原子，（取代）烷基或（取代）脂环烃基。该醇盐化合物适用于用于正向调节辐射敏感树脂组成物的光酸发生剂。含有该化合物的正向调节辐射敏感树脂组成物是一种化学放大的光刻胶，具有高灵敏度和高分辨率，对各种辐射具有响应性，并具有优异的储存稳定性。
• RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN
  申请人：Matsumura Nobuji

  公开号：US20090280433A1

  公开（公告）日：2009-11-12

  A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.

  一种辐射敏感组合物包含（A）低分子量化合物，其具有一个或多个酸解离基团，该基团在酸作用下分解，以增强其在碱性显影液中的溶解性，并且每个分子具有一个或多个辐射敏感酸生成基团，该基团在施加活性射线或辐射时产生酸，并且其聚苯乙烯还原平均分子量（Mn）通过凝胶渗透色谱（GPC）测量为500至4,000，并且（B）溶剂。
• COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：Ebata Takuma

  公开号：US20100221659A1

  公开（公告）日：2010-09-02

  A compound has a partial structure shown by a following formula (1), wherein R 1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R 2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.

  以下是化合物的部分结构式（1），其中R1代表氢原子或具有1至8个碳原子的取代或未取代的碳氢基团，R2代表具有1至8个碳原子的取代或未取代的碳氢基团，Rf代表氟原子或具有1至4个碳原子的全氟烷基团，L表示从0到4的整数，n表示从0到10的整数，m表示从1到4的整数。
• RADIATION-SENSITIVE COMPOSITION
  申请人：JSR Corporation

  公开号：US20130108962A1

  公开（公告）日：2013-05-02

  A radiation-sensitive composition includes a low-molecular-weight compound, a solvent and a radiation-sensitive acid-generator other than the low-molecular-weight compound. The low-molecular-weight compound has one or more acid-dissociable groups which decompose by an action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule. The low-molecular-weight compound has a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000. The low-molecular-weight compound is not obtained from chain growth polymerization of a monomer with an unsaturated bond. A content of the low-molecular-weight compound is 80 mass % or more of 100 mass % of a total solid component of the radiation-sensitive composition. The low-molecular-weight compound is a compound shown by a following formula (1).

  一种辐射敏感组合物包括低分子量化合物、溶剂和除低分子量化合物外的辐射敏感酸发生剂。低分子量化合物具有一个或多个酸可解离基团，这些基团在酸的作用下分解，增强在碱性显影液中的溶解度，以及一个或多个辐射敏感酸生成基团，每个分子在施加活性射线或辐射时生成酸。低分子量化合物的聚苯乙烯还原数平均分子量（Mn）通过凝胶渗透色谱（GPC）测量为500至4,000。低分子量化合物不是从具有不饱和键的单体的链生长聚合中获得的。低分子量化合物的含量是辐射敏感组合物的100质量％的总固体成分的80质量％或更多。低分子量化合物是以下公式（1）所示的化合物。