octahydro-4,7-methano-1H-indene-5-methyl acetate | 85909-53-1

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: octahydro-4,7-methano-1H-indene-5-methyl acetate
• 英文别名: Octahydro-4,7-methano-1H-indene-5-methyl acetate；8-tricyclo[5.2.1.02,6]decanylmethyl acetate
• CAS: 85909-53-1
• 化学式: C₁₃H₂₀O₂
• 分子量: 208.301
• InChiKey: NZRPNXAEGFLETH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Ester compound, and cosmetic component and cosmetic product each containing same
  申请人：Kokyu Alcohol Kogyo Co., Ltd.

  公开号：US10010493B2

  公开（公告）日：2018-07-03

  The purpose of the present invention is to provide a novel ester compound which can be used as a component of a cosmetic component. An ester compound of tricyclo[5.2.1.02,6]decane, which is represented by formula (I).

  本发明的目的是提供一种可用作化妆品成分的新型酯类化合物。一种三环[5.2.1.02,6]癸烷的酯类化合物，由式（I）表示。
• Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing
  申请人：FUJIFILM Corporation

  公开号：US10928727B2

  公开（公告）日：2021-02-23

  According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.

  根据本发明，提供了一种光敏或辐射敏感树脂组合物，其中包括在酸的作用下在碱显影剂中的溶解速率会降低的化合物（A）、疏水性树脂（B）和具有芳香环的树脂（C），以及使用该组合物的薄膜、掩膜坯、图案形成方法和电子设备制造方法。
• NOVEL ESTER COMPOUND, AND COSMETIC COMPONENT AND COSMETIC PRODUCT EACH CONTAINING SAME
  申请人：Kokyu Alcohol Kogyo Co., Ltd.

  公开号：EP3098216B1

  公开（公告）日：2019-11-06
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20180120701A1

  公开（公告）日：2018-05-03

  According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.