2-acetyltricyclo[5.2.1.02,6]decane | 1195346-15-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-acetyltricyclo[5.2.1.02,6]decane
• 英文别名: 2-acetylendotricyclo[5.2.1.02,6]decane；1-(2-Tricyclo[5.2.1.02,6]decanyl)ethanone
• CAS: 1195346-15-6
• 化学式: C₁₂H₁₈O
• 分子量: 178.274
• InChiKey: WMGKUIVHRSOJHL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  13
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CONTAINING NAPHTHOL COMPOUND AND ESTER COMPOUND
  申请人：Kita Seiji

  公开号：US20120238775A1

  公开（公告）日：2012-09-20

  A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.

  通过使用下列通式[1]所代表的单元作为分子单元，将多官能团二甲基萘醛树脂改性，至少使用下列通式[2]所代表的酚、下列通式[3]所代表的萘酚或下列通式[4]所代表的萘酚中的一种对其进行改性，其中至少包含下列通式[3]所代表的萘酚或下列通式[4]所代表的萘酚中的任意一种。
• COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2219076A1

  公开（公告）日：2010-08-18

  A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.

  本发明提供了一种用于形成光刻用底层膜的组合物，该组合物可赋予光刻用底层膜优异的光学特性和抗蚀刻性，由该组合物形成的底层膜具有高折射率（n）和低消光系数（k）、透明、高抗蚀刻性、含有显著少量的可升华成分，以及使用该底层膜形成图案的方法。用于形成底层膜的组合物包含一种萘甲醛聚合物（其特定单元通过萘和/或烷基萘与甲醛反应而获得）和一种有机溶剂。
• US8524952B2
  申请人：——

  公开号：US8524952B2

  公开（公告）日：2013-09-03
• US8563665B2
  申请人：——

  公开号：US8563665B2

  公开（公告）日：2013-10-22
• US8519177B2
  申请人：——

  公开号：US8519177B2

  公开（公告）日：2013-08-27