3-Oxatricyclo<6.2.1.0^2,7>undecan-4-on | 57051-33-9

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 3-Oxatricyclo<6.2.1.0^2,7>undecan-4-on
• 英文别名: octahydro-5,8-methano-chromen-2-one；3-Oxatricyclo[6.2.1.02,7]undecan-4-one
• CAS: 57051-33-9
• 化学式: C₁₀H₁₄O₂
• 分子量: 166.22
• InChiKey: XEBJUYJJIRTYLM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
  申请人：Maeda Katsumi

  公开号：US20070218403A1

  公开（公告）日：2007-09-20

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本文披露了一种光刻用220纳米或以下光的光阻材料，包括至少一种由以下式子（2）表示的聚合物和用于曝光生成酸的光酸发生剂： 其中，R1、R2、R3和R5分别是氢原子或甲基基团；R4是酸敏感基团、具有7至13个碳原子的脂环烃基团、具有酸敏感基团的7至13个碳原子的脂环烃基团、具有3至13个碳原子的环烃基团、具有环氧基团；R6是氢原子、具有1至12个碳原子的碳氢基团或具有7至13个碳原子的脂环烃基团，具有羧基；x、y和z是可选值，满足x+y+z=1，0树脂： 其中，R8是氢原子或甲基基团，R9是具有脂环内酯结构的7至16个碳原子的碳氢基团。
• (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT
  申请人：Maeda Katsumi

  公开号：US20110196122A1

  公开（公告）日：2011-08-11

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本文披露了一种光刻用于220nm或更低波长的光的光阻材料，其包括至少由以下化学式(2)表示的聚合物和用于曝光后生成酸的光酸发生剂：其中，R1、R2、R3和R5分别为氢原子或甲基基团；R4为酸敏感基团、具有7至13个碳原子的脂环烃基团，其具有酸敏感基团、具有7至13个碳原子的脂环烃基团，其具有羧基基团，或具有3至13个碳原子的碳氢基团，其具有环氧基团；R6为氢原子、具有1至12个碳原子的碳氢基团，或具有7至13个碳原子的脂环烃基团，其具有羧基基团；x、y和z是可选值，满足x+y+z=1，0树脂：其中，R8为氢原子或甲基基团，R9为具有脂环内酯结构的7至16个碳原子的碳氢基团。
• US7186495B2
  申请人：——

  公开号：US7186495B2

  公开（公告）日：2007-03-06
• US7432035B2
  申请人：——

  公开号：US7432035B2

  公开（公告）日：2008-10-07
• US8119751B2
  申请人：——

  公开号：US8119751B2

  公开（公告）日：2012-02-21