exo-4-Hydroxy-endo-endo-tetracyclo<6.2.1.1.^3,60^2,7>dodecan | 61527-73-9

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: exo-4-Hydroxy-endo-endo-tetracyclo<6.2.1.1.^3,60^2,7>dodecan
• 英文别名: exo-4-Hydroxy-exo-endo-tetracyclo<6.2.1.1.^3,60^2,7>dodecan；exo-4-Hydroxy-exo-exo-tetracyclo<6.2.1.1.^3,60^2,7>dodecan；2-Hydroxy-1,4,5,8-di-(endomethylen)-octalin；exo-4-Hydroxy-exo-endo-tetracyclo(6.2.1.13,602,7)；tetracyclo[6.2.1.13,6.02,7]dodecan-4-ol
• CAS: 61527-73-9
• 化学式: C₁₂H₁₈O
• 分子量: 178.274
• InChiKey: LXGJTVCALLQHGZ-UHFFFAOYSA-N

物化性质

• 熔点：
  76.5-78 °C
• 沸点：
  87-90 °C(Press: 0.1 Torr)
• 密度：
  1.165±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION
  申请人：Fukumoto Takashi

  公开号：US20120148954A1

  公开（公告）日：2012-06-14

  Disclosed are an N-acyl-β-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-β-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer. In the formula, R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents an alkylene group or a cycloalkylene group; n represents 0 or 1; and each of R 2 , R 3 , R 4 , and R 5 independently represents a hydrogen atom, an alkyl group, a cyclic hydrocarbon group, or an acyloxy group, provided that 1) R 2 and R 3 , or R 4 and R 5 , may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, 2) R 3 and R 4 may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, and 3) all of R 2 , R 3 , R 4 , and R 5 are not a hydrogen atom at the same time.

  本公开了一种N-酰基-β-内酰胺衍生物，其由以下通用式表示，从中可以获得一种能够控制酸扩散长度较短的光刻胶组合物；一种由将以下通用式表示的N-酰基-β-内酰胺衍生物聚合而成的聚合物作为起始材料之一；以及含有该聚合物的光刻胶组合物。在该式中，R1代表氢原子、甲基或三氟甲基基团；W代表烷基基团或环烷基基团；n代表0或1；而R2、R3、R4和R5中的每一个独立地代表氢原子、烷基基团、环烃基团或酰氧基团，前提是1）R2和R3，或R4和R5，可以连接在一起形成一个取代或未取代的环，该环在任意位置可能有一个氧原子，2）R3和R4可以连接在一起形成一个取代或未取代的环，该环在任意位置可能有一个氧原子，3）R2、R3、R4和R5中的所有基团不同时为氢原子。
• Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same
  申请人：Central Glass Company, Limited

  公开号：US20150198879A1

  公开（公告）日：2015-07-16

  Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R 01 represents a hydrogen atom or a monovalent organic group, and M + represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

  本公开了一种含氟磺酸盐树脂，其具有以下通用式（3）所代表的重复单元。在该式中，每个A独立地表示氢原子、氟原子或三氟甲基基团，n表示1-10的整数。W表示二价连接基团，R01表示氢原子或一价有机基团，M+表示一价阳离子。含有该树脂的抗蚀组合物在感光性、分辨率和掩膜图案的重现性方面更加优越，并且能够形成具有较低LER的图案。
• Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
  申请人：Kinsho Takeshi

  公开号：US20070218402A1

  公开（公告）日：2007-09-20

  Fluorine-containing silicon compounds having the general formula (1): wherein X 1 , X 2 , and X 3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, Y is a divalent organic group, R 1 and R 2 are each independently hydrogen or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or R 1 and R 2 may bond together to form a ring with the carbon atom to which they are attached silicone resins obtained from the compounds of formula (1) has an appropriate acidity to enable formation of a finer pattern while minimizing the pattern collapse by swelling when used in a resist composition.

  具有通式（1）的含氟硅化合物： 其中X1、X2和X3分别为氢、羟基、卤素、1至6个碳原子的直链、支链或环烷氧基，或具有1至20个碳原子的直链、支链、环状或多环骨架的一价有机基团，Y为二价有机基团，R1和R2分别独立地为氢或具有1至20个碳原子的直链、支链、环状或多环骨架的一价有机基团，或者R1和R2可以结合在一起形成一个环，与它们附着的碳原子结合。从式（1）的化合物中获得的硅树脂具有适当的酸度，可在最小化模式坍塌的情况下形成更细的模式，当用于光阻组合物时发生膨胀。
• (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT
  申请人：NEC Corporation

  公开号：US20150183912A1

  公开（公告）日：2015-07-02

  A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R 6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0

  一种用于光刻的光阻材料，使用220纳米或更短波长的光，包括至少一种由下式（2）表示的聚合物和用于曝光生成酸的光酸发生剂：其中，R1、R2、R3和R5分别为氢原子或甲基基团；R4是酸敏基团或指定子集的脂环烃基团、脂环烃基团或烃基团之一；R6是氢原子或指定子集的烃基团或脂环烃基团之一；x、y和z是可选值，满足x+y+z=1，0
• RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMERIC COMPOUND, AND COMPOUND
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：EP2584409A1

  公开（公告）日：2013-04-24

  According to the present invention, there are provided a resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The aforementioned resist composition contains a polymeric compound (A) containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).

  根据本发明，提供了一种可形成具有优异光刻性能的极精细抗蚀剂图案的抗蚀剂组合物、一种可用于该抗蚀剂组合物的新型高分子化合物，以及一种可用作该高分子化合物单体的化合物。上述抗蚀剂组合物含有一种聚合物化合物（A），该化合物含有由下图所示通式（a0）表示的结构单元（a0）。在式 (a0) 中，A 是通式 (1) 或 (2) 所代表的阴离子。