5-[(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornan-2-yl vinyl ether | 849811-87-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 5-[(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornan-2-yl vinyl ether
• 英文别名: 1,1,1,3,3,3-Hexafluoro-(5-vinyloxy-bicyclo[2.2.1]hept-2-ylmethyl)-propan-2-ol；5-[3,3,3-Trifluoro-2-(trifluoromethyl)-2-hydroxypropyl]-2-(vinyloxy)norbornane；2-[(5-ethenoxy-2-bicyclo[2.2.1]heptanyl)methyl]-1,1,1,3,3,3-hexafluoropropan-2-ol
• CAS: 849811-87-6
• 化学式: C₁₃H₁₆F₆O₂
• 分子量: 318.259
• InChiKey: CZMNCDNSCZJHCJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  21
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.85
• 拓扑面积：
  29.5
• 氢给体数：
  1
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  2-hydroxy-5-[(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornane 、 乙烯基乙醚 在 mercury(II) diacetate 三乙胺 作用下， 反应 53.0h， 生成 5-[(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornan-2-yl vinyl ether
  参考文献：
  名称：

  Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions

  摘要：

  提供具有结构式（I）的氟化乙烯醚，其中结构式（I）中的X和Y中至少有一个是氟原子，而L、R1、R2、R3、R4如本文所定义。还提供由（I）和可能不是氟化的第二单体进行自由基聚合制备的共聚物。这些聚合物在光刻光阻组合物中很有用，特别是化学放大光阻。在一个首选实施例中，这些聚合物对深紫外（DUV）辐射几乎透明，因此在DUV光刻光阻组合物中很有用。还提供一种使用该组合物在基板上生成抗蚀图像的方法，即在集成电路或类似产品的制造中。

  公开号：

  US20060287558A1

文献信息

• Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions
  申请人：DiPietro A. Richard

  公开号：US20060287558A1

  公开（公告）日：2006-12-21

  Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I) wherein at least one of X and Y is a fluorine atom, and L, R 1 , R 2 , R 3 , R 4 are as defined herein. Also provided are copolymers prepared by radical polymerization of (I) and a second monomer that may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

  提供具有结构式（I）的氟化乙烯醚，其中结构式（I）中的X和Y中至少有一个是氟原子，而L、R1、R2、R3、R4如本文所定义。还提供由（I）和可能不是氟化的第二单体进行自由基聚合制备的共聚物。这些聚合物在光刻光阻组合物中很有用，特别是化学放大光阻。在一个首选实施例中，这些聚合物对深紫外（DUV）辐射几乎透明，因此在DUV光刻光阻组合物中很有用。还提供一种使用该组合物在基板上生成抗蚀图像的方法，即在集成电路或类似产品的制造中。
• Preparation of topcoat compositions and methods of use thereof
  申请人：International Business Machines Corporation

  公开号：US07473749B2

  公开（公告）日：2009-01-06

  A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from an alcohol is provided. Also provided is a method of forming an image on a photoresist that includes forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

  提供一种包括含氟聚合物和从醇中选择的铸模溶剂的面漆组合物。还提供一种在光阻剂上形成图像的方法，包括在基板上形成光阻剂；施加一种面漆组合物，该面漆组合物包括至少一种含氟聚合物和一个铸模溶剂，施加到光阻剂上；去除面漆组合物的铸模溶剂，从而形成光阻剂上的面漆材料；将光阻剂暴露在辐射下，辐射改变光阻剂暴露于辐射的区域的化学组成，形成光阻剂中的暴露和未暴露区域；和去除i)面漆材料和ii)光阻剂的暴露区域或未暴露区域。