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isopropyl norbornyl ether | 165055-71-0

中文名称
——
中文别名
——
英文名称
isopropyl norbornyl ether
英文别名
2-Propan-2-yloxybicyclo[2.2.1]heptane
isopropyl norbornyl ether化学式
CAS
165055-71-0
化学式
C10H18O
mdl
——
分子量
154.252
InChiKey
LOOXXBKIFRVBHN-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.6
  • 重原子数:
    11
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    9.2
  • 氢给体数:
    0
  • 氢受体数:
    1

文献信息

  • SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    申请人:ICHIKAWA Koji
    公开号:US20100304292A1
    公开(公告)日:2010-12-02
    A salt represented by the formula (I-BB): wherein Q 1 and Q 2 each independently represent a fluorine atom etc., X 1 represents a single bond etc., Y 1 represents a C1-C36 aliphatic hydrocarbon group etc., A 1 and A 2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar 1 represents a (m 4 +1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B 1 represents a single bond etc., B 2 represents a C4-C36 alicyclic hydrocarbon group which has one or more —OX a groups and which is not capable of being eliminated by the action of an acid etc., and X a represents a hydrogen atom or a group capable of being eliminated by the action of an acid, m 1 and m 2 independently each represents an integer of 0 to 2, m 3 represents an integer of 1 to 3, with the proviso that m 1 plus m 2 plus m 3 equals 3, and m 4 represents an integer of 1 to 3.
    由公式(I-BB)表示的盐,其中Q1和Q2各自独立代表一个原子等,X1代表一个单键等,Y1代表一个C1-C36脂肪烃基等,A1和A2各自独立代表一个C1-C20脂肪烃基等,Ar1代表一个(m4+1)价的C6-C20芳香烃基,该芳香烃基可以有一个或多个取代基,B1代表一个单键等,B2代表一个C4-C36的脂环烃基,该脂环烃基具有一个或多个—OXa基团,并且不能通过酸的作用被消除,Xa代表一个氢原子或一个可以通过酸的作用被消除的基团,m1和m2各自独立代表一个0到2的整数,m3代表一个1到3的整数,前提是m1加m2加m3等于3,且m4代表一个1到3的整数。
  • Process for Production of Carboxylic Acid Ester or Ether Compound
    申请人:Choi Jun-Chul
    公开号:US20090012324A1
    公开(公告)日:2009-01-08
    Disclosed is a process for production of a carboxylic acid ester from a carboxylic acid and an olefin or production of an ether compound from an alcohol and an olefin at low cost and with high yield in an industrially advantageous manner. The process comprises the step of reacting a carboxylic acid with an olefin to yield a corresponding carboxylic acid ester or reacting an alcohol with an olefin to yield a corresponding ether compound. In the process, a catalyst comprising a combination of (i) at least one metal compound selected from an iron compound, a cobalt compound and a nickel compound and (ii) an acidic compound is used.
    揭示了一种以低成本、高产率且在工业上具有优势的方式,从羧酸和烯烃生产羧酸酯或从醇和烯烃生产醚化合物的过程。该过程包括将羧酸与烯烃反应以产生相应的羧酸酯,或将醇与烯烃反应以产生相应的醚化合物的步骤。在该过程中,使用包括(i)至少一种选自化合物、化合物和化合物的属化合物和(ii)酸性化合物的组合作为催化剂。
  • PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME
    申请人:LEE Jae-Woo
    公开号:US20090155714A1
    公开(公告)日:2009-06-18
    A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R′″ is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.
    本发明揭示了一种比传统光刻胶更小的大小,具有明确定义(均匀)结构的光敏化合物,以及包括该光敏化合物的光刻胶组合物。该光敏化合物由以下公式表示。此外,本发明提供了一种光刻胶组合物,包括1至85重量%(重量%)的光敏化合物;相对于100重量部的光敏化合物0.05至重量份的光酸发生剂;以及10至5000重量部的有机溶剂。在公式中,n为0或1,x为1、2、3、4或5,y为2、3、4、5或6,z为0、1、2、3或4,R、R'和R"分别为1至30碳原子的烃基,优选为2至20碳原子,R'"为氢原子或1至30碳原子的烃基,优选为2至20碳原子。
  • RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER
    申请人:Momose Hikaru
    公开号:US20090198065A1
    公开(公告)日:2009-08-06
    To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n≧3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; K 1 and K 2 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; L 1 and L 2 each represent at least one selected from —C(O)O—, —C(O)— and —OC(O)—; M 1 , M 2 and M 3 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Y 1 and Y 2 each represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, and m3 each represent 0 or 1; and R 1 represents H or a methyl group.
    提供一种抗蚀聚合物,其由一个具有结构式(1)或(2)所表示的酸分解单元作为结构单元,能够在DUV准分子激光微影或类似工艺中表现出小的线边粗糙度并产生少量缺陷。在式(1)和(2)中,n表示2至24的整数;J表示单键或二价碳氢基团,当n=2时可以具有取代基/杂原子,或者当n≥3时可以表示n价碳氢基团,可以具有取代基/杂原子;E表示聚合终止剂、链转移剂或聚合引发剂的残基;K1和K2分别表示至少选择自烷基、环烷基、氧烷基、芳烃、二价噻唑环、二价噁唑环和二价咪唑环中的至少一种;L1和L2分别表示至少选择自—C(O)O—、—C(O)—和—OC(O)—中的至少一种;M1、M2和M3分别表示至少选择自烷基、环烷基、氧烷基和芳烃中的至少一种;Y、Y1和Y2分别表示酸分解键;k1、k2、l1、L2、m1、m2和m3分别表示0或1;R1表示H或甲基基团。
  • Novel peptides as NS3-serine protease inhibitors of hepatitis C virus
    申请人:Saksena K. Anil
    公开号:US20070032433A1
    公开(公告)日:2007-02-08
    The present invention discloses novel compounds which have HCV protease inhibitory activity as well as methods for preparing such compounds. In another embodiment, the invention discloses pharmaceutical compositions comprising such compounds as well as methods of using them to treat disorders associated with the HCV protease.
    本发明揭示了具有HCV蛋白酶抑制活性的新化合物,以及制备这些化合物的方法。在另一种实施方式中,本发明揭示了包含这些化合物的药物组合物,以及使用它们治疗与HCV蛋白酶相关的疾病的方法。
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