Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern
申请人:——
公开号:US20020068237A1
公开(公告)日:2002-06-06
The present invention provides a negative photosensitive resin composition comprising (A) a photocurable resin having a photosensitive group or groups crosslinkable by light irradiation, (B) a photoacid generator and (C) a photosensitizer which is a benzopyran condensed ring compound capable of increasing photosensitivity to visible light with a wavelength of 480 nm or more,
a negative photosensitive dry film prepared by applying the photosensitive resin composition to a surface of support film, followed by drying, to form a photosensitive resin layer, and
a method of forming a pattern using the resin composition or the dry film.