2,5-Dioxo-1-pyrrolidinyl 7,7-dimethyl-2-oxobicyclo[2.2.1]heptane-1-methanesulfonate | 179419-32-0

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2,5-Dioxo-1-pyrrolidinyl 7,7-dimethyl-2-oxobicyclo[2.2.1]heptane-1-methanesulfonate
• 英文别名: (2,5-dioxopyrrolidin-1-yl) (7,7-dimethyl-2-oxo-1-bicyclo[2.2.1]heptanyl)methanesulfonate
• CAS: 179419-32-0
• 化学式: C₁₄H₁₉NO₆S
• 分子量: 329.37
• InChiKey: QVCXHENTVHRSEB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  22
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.79
• 拓扑面积：
  106
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200262787A1

  公开（公告）日：2020-08-20

  The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种包括含碲化合物或含碲树脂的光学元件成型组合物。
• METHOD FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP
  申请人：Kyowa Hakko Chemical Co., Ltd.

  公开号：EP1661918A1

  公开（公告）日：2006-05-31

  The present invention provides a process for producing a compound having a group represented by general formula (II): (wherein R1, R2, and R3 may be the same or different, and each represent a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or a substituted or unsubstituted aralkyl, or R1 and R2 may bind to each other to form an alicyclic hydrocarbon ring together with the adjacent carbon atoms, or R2 and R3 may bind to each other to form a alicyclic heterocyclic ring together with the adjacent O-C-C that may have a substituent), which comprises allowing a compound having a hydroxyl group to react with halogenated alkyl ether represented by general formula (I): (wherein R1, R2, and R3 are the same as those defined above, respectively and X represents a halogen atom).

  本发明提供了一种生产具有由通式（II）表示的基团的化合物的方法：（其中R1、R2和R3可以相同也可以不同，并且分别表示取代或未取代的烷基、取代或未取代的芳基、或取代或未取代的芳基烷基，或者R1和R2可以相互结合形成与相邻碳原子一起的脂环碳氢环，或者R2和R3可以相互结合形成与相邻的O-C-C一起具有取代基的脂环杂环）的方法，该方法包括允许具有羟基的化合物与由通式（I）表示的卤代烷基醚发生反应：（其中R1、R2和R3分别与上述定义相同，X代表卤素原子）。
• DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING
  申请人：NAKASUGI Shigemasa

  公开号：US20140087311A1

  公开（公告）日：2014-03-27

  The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound.

  该发明提供了一种交联剂，能够防止底部抗反射涂层形成浮渣，并提供了一种含有该剂的底部抗反射涂层形成组合物。该交联剂是一种含有至少一个乙烯氧基团或N-甲氧甲基酰胺基团的含氮芳香化合物，该组合物含有该交联剂。式（1）的交联剂可通过含氮芳香化合物、具有乙烯氧基团或N-甲氧甲基酰胺基团的卤素化合物以及碱性化合物的反应制备。