Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator
申请人:Nippon Kayaku Kabushiki Kaisha
公开号:US20200392079A1
公开(公告)日:2020-12-17
This compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays, is represented by formula (1), where, in formula (1), R
1
, R
2
, R
3
, R
5
and R
6
represent a hydroxy group or an alkoxy group; the R
4
's independently represent an organic group containing a thioether bond; R
7
and R
9
independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons; R
8
represents an alkylene group or an arylene group; and X represents an oxygen atom or a sulfur atom. A photopolymerization initiator can include said novel compound; and a photosensitive resin composition can include said photopolymerization initiator, from which a cured product can be obtained that has high sensitivity and no metal corrosion.
这种化合物具有优异的溶剂溶解性和与树脂的兼容性,可以通过受到活性能量辐射而高效地产生碱基和自由基。该化合物由公式(1)表示,其中在公式(1)中,R1、R2、R3、R5和R6代表羟基或烷氧基;R4分别表示含硫醚键的有机基团;R7和R9分别代表氢原子或1至4个碳的烷基基团;R8代表烷基或芳基;X代表氧原子或硫原子。一种光聚合引发剂可以包括上述新化合物;一种光敏树脂组合物可以包括上述光聚合引发剂,从中可以得到高灵敏度且无金属腐蚀的固化产物。