Novel onium salts, photoacid generators, resist compositions, and patterning process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20020076643A1
公开(公告)日:2002-06-20
Onium salts of arylsulfonyloxynaphthalenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.
芳基磺酸氧基萘磺酸盐的离子(离子包括碘离子或亚磺酸盐阳离子)是新颖的。 化学增感抗蚀剂组合物包括该离子盐作为光酸发生剂,适用于微细加工,特别是深紫外光刻,因为具有许多优点,包括提高分辨率,提高焦距范围,即使在长期PED上也能最小化线宽变化或形状退化,涂层、显影和剥离后最小化残留物,并在显影后改善图案轮廓。