3-endo-hydroxy-7-endo-methyl-bicyclo<3.3.1>nonane | 37741-57-4

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 3-endo-hydroxy-7-endo-methyl-bicyclo<3.3.1>nonane
• 英文别名: 3-endo-hydroxy-7-exo-methyl-bicyclo<3.3.1>nonane；3-exo-hydroxy-7-endo-methyl-bicyclo<3.3.1>nonane；3-exo-hydroxy-7-exo-methyl-bicyclo<3.3.1>nonane；3-endo-hydroxy-7-endo-methyl-bicyclo[3.3.1]nonane；3-endo-hydroxy-7-exo-methyl-bicyclo[3.3.1]nonane；3-exo-hydroxy-7-exo-methyl-bicyclo[3.3.1]nonane；7-Methylbicyclo[3.3.1]nonan-3-ol
• CAS: 37741-57-4；40727-30-8；40727-35-3；62960-67-2
• 化学式: C₁₀H₁₈O
• 分子量: 154.252
• InChiKey: GLQLJZMRXJFYIM-UHFFFAOYSA-N

物化性质

• 沸点：
  237.8±8.0 °C(Predicted)
• 密度：
  0.978±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  7-亚甲基双环[3.3.1]壬-3-酮 在 一氧化碳 氢气 作用下， 以 环己烷 为溶剂， 20.0~25.0 ℃ 、106.39 kPa 条件下， 反应 1.0h， 以64%的产率得到7-endo-methyl-3-one-bicyclo<3.3.1>nonane
  参考文献：
  名称：

  VIII族金属催化剂在非共轭烯酮加氢中的化学选择性

  摘要：

  VIII族金属催化剂的化学选择性已在常温氢气压力下非共轭烯酮的氢化中得到检验。钴催化剂从三烷基化烯烃酮中得到高收率的不饱和醇。在铂金属催化剂中，锇在三烷基化烯烃酮的加氢反应中对羰基键的还原显示出最高的选择性。无论催化剂如何，单烷基化和二烷基化烯烃酮的氢化通常以烯烃官能团的优先饱和进行。4-亚甲基-和4-亚乙基环己酮的氢化伴随着在乙醇溶剂中在钌、铑和钯黑催化剂上形成二乙缩醛。在其他烯酮的氢化和其他催化剂上未检测到缩醛。此外，还研究了镍和钴催化剂对无环烯酮加氢的化学选择性。

  DOI：

  10.1246/bcsj.60.1721

文献信息

• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20190112286A1

  公开（公告）日：2019-04-18

  A salt comprising a group represented by the formula (aa):

  一种由公式（aa）所表示的群组的盐：
• COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210389669A1

  公开（公告）日：2021-12-16

  Disclosed are a compound represented by formula (I), a resin and a resist composition: wherein R 1 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen, hydrogen or halogen atom, R 2 and R 3 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R 4 represents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH 2 — included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—, R 5 represents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or an acid-labile group, m2 represents an integer of 1 to 4, m4 represents an integer of 0 to 3, and m5 represents 1 or 2, in which 2≤m2+m4+m5≤5.

  揭示了一种由公式（I）表示的化合物，树脂和抗蚀组合物： 其中R1代表具有1至6个碳原子的烷基基团，其可以具有卤素，氢或卤素原子，R2和R3各自独立地表示氢原子或具有1至12个碳原子的碳氢基团，R4表示氟原子，具有1至6个碳原子的烷基氟化物基团或具有1至12个碳原子的烷基基团，且包括在烷基氟化物基团和烷基基团中的-CH2-可以被- O-或-CO-所取代，R5表示氢原子，具有2至6个碳原子的烷基羰基基团或酸敏感基团，m2表示1至4的整数，m4表示0至3的整数，m5表示1或2，在其中2≤m2+m4+m5≤5。
• Resist composition
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US10795258B2

  公开（公告）日：2020-10-06

  A resist composition which contains a resin (A1) which has a structural unit having a sulfonyl group, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, “g” represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.

  一种抗蚀剂组合物，其中包含一种树脂 (A1)，该树脂具有具有磺酰基的结构单元、由式 (II) 表示的结构单元和具有耐酸基的结构单元，以及一种酸发生器： 其中 R1 代表氢原子、卤素原子或可能具有卤素原子的 C1 至 C6 烷基，L1 代表单键或 *-L2-CO-O-(L3-CO-O)g-，其中 * 代表与氧原子的结合位置，L2 和 L3 独立地代表 C1 至 C12 二价烃基，"g "代表 0 或 1，R3 代表 C1 至 C12 直链或支链烷基（叔烷基除外）。
• Salt and photoresist composition containing the same
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US10882839B2

  公开（公告）日：2021-01-05

  A salt containing a group represented by the formula (aa): wherein Xa and Xb independently each represent an oxygen atom or a sulfur atom, a ring W represents a C3-C18 heterocycle which has a carbonate ester structure and which can have a substituent, and * represents a binding position is provided.

  含有式 (aa) 所代表基团的盐： 其中，Xa 和 Xb 各自独立地代表氧原子或硫原子，环 W 代表具有碳酸酯结构且可具有取代基的 C3-C18 杂环，* 代表结合位置。
• RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20200064735A1

  公开（公告）日：2020-02-27

  Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same: