2-Bicyclo[2.2.1]hept-2-yl-propionic acid | 92015-79-7

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-Bicyclo[2.2.1]hept-2-yl-propionic acid
• 英文别名: 2-(Bicyclo[2.2.1]heptan-2-yl)propanoic acid；2-(2-bicyclo[2.2.1]heptanyl)propanoic acid
• CAS: 92015-79-7
• 化学式: C₁₀H₁₆O₂
• 分子量: 168.236
• InChiKey: ALAUAQSSTNVKJZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• NOVEL BISPHOSPHONIC ACID COMPOUND
  申请人：Fuji Yakuhin Co., Ltd.

  公开号：EP3409679A1

  公开（公告）日：2018-12-05

  It is intended to provide a novel bisphosphonic acid compound or a salt thereof which shows a remarkable inhibitory effect on ectopic calcification, and a pharmaceutical composition comprising the same. The present invention provides a bisphosphonic acid compound represented by the following formula (1) or a pharmaceutically acceptable salt thereof: wherein ------- represents a single bond or a double bond; A represents a saturated cyclic hydrocarbon or a saturated heterocyclic ring comprising a sulfur atom or an oxygen atom; and R1 and R2 each independently represent an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryloxy group, a haloalkoxy group, a haloalkyl group, a halogen atom or a hydrogen atom.

  本发明旨在提供一种对异位钙化具有显著抑制作用的新型双膦酸化合物或其盐，以及由其组成的药物组合物。本发明提供了由下式（1）代表的双膦酸化合物或其药学上可接受的盐： 其中 ------- 代表单键或双键；A 代表饱和环状烃或包含硫原子或氧原子的饱和杂环；R1 和 R2 各自独立地代表烷基、烯基、炔基、烷氧基、芳氧基、卤代烷氧基、卤代烷基、卤原子或氢原子。
• Bisphosphonic acid compound
  申请人：FUJIYAKUHIN CO., LTD.

  公开号：US10689408B2

  公开（公告）日：2020-06-23

  It is intended to provide a novel bisphosphonic acid compound or a salt thereof which shows a remarkable inhibitory effect on ectopic calcification, and a pharmaceutical composition comprising the same. The present invention provides a bisphosphonic acid compound represented by the following formula (1) or a pharmaceutically acceptable salt thereof: wherein represents a single bond or a double bond; A represents a saturated cyclic hydrocarbon or a saturated heterocyclic ring comprising a sulfur atom or an oxygen atom; and R1 and R2 each independently represent an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryloxy group, a haloalkoxy group, a haloalkyl group, a halogen atom or a hydrogen atom.

  本发明旨在提供一种对异位钙化具有显著抑制作用的新型双膦酸化合物或其盐，以及由其组成的药物组合物。本发明提供了由下式（1）代表的双膦酸化合物或其药学上可接受的盐： 其中代表单键或双键；A 代表饱和环状烃或包含硫原子或氧原子的饱和杂环；R1 和 R2 各自独立地代表烷基、烯基、炔基、烷氧基、芳氧基、卤代烷氧基、卤代烷基、卤原子或氢原子。
• Ink composition, inkjet recording method, printed material, process for producing lithographic plate, and lithographic printing plate
  申请人：FUJIFILM Corporation

  公开号：EP1762599B1

  公开（公告）日：2008-03-05
• HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES
  申请人：De Binod B.

  公开号：US20080206667A1

  公开（公告）日：2008-08-28

  An etch resistant thermally curable Underlayer for use in a multiplayer liyhographic process to produce a photolithographic bilayer coated substrate, the composition having: (a) at least one cycloolefin polymer comprising at least one repeating unit of Structure (I), and at least one repeating unit of Structure (II), and optionally at least one repeating unit of Structure (III) with the proviso that neither Structure (I) nor Structure (II) nor Structure (III) contains acid sensitive groups. b) at least one cross-linking agent selected from the group consisting of an amino or phenolic cross-linking agent; c) a least one thermal acid generator (TAG); d) at lest one solvent; and e) optionally, at least one surfactant.
• THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION
  申请人：De Binod B.

  公开号：US20120178871A1

  公开（公告）日：2012-07-12

  An etch resistant thermally curable Underlayer composition for use in a multiplayer lithographic process for producing a photolithographic bilayer coated substrate, the composirion being a composition of: (a) a polymer comprising repeating units of Structure I, II and III (b) at least one crosslinking agent; (c) at least one thermal acid generator; and (d) at least one solvent.