Photosensitive solubilization inhibitor compounds of the formula
wherein:
x is an integer equal to the valence or functionality of the radical R, and
R is a radical selected from the group consisting of the residue of a mono-, di-, tri- or polyfunctional alkanol or silicon-containing alkanol and is attached to the oxy atom of the carboxyl group through a carbon atom.
Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and the photosensitive solubilization inhibition agents. Lithographic resist images are formed with the deep ultra-violet photoresists upon exposure to deep ultra-violet light.
式中的光敏溶解
抑制剂化合物,其中:x 是等于基 R 的价数或官能度的整数,R 是选自单官能度、双官能度、三官能度或多官能度烷醇或含
硅烷醇的残基所组成的组中的基,并通过一个碳原子连接到羧基的氧原子上。 可碱基显影的正性深紫外光阻剂包括碱溶性聚合物和光敏溶解
抑制剂。 在深紫外光照射下,深紫外光阻剂可形成平版印刷抗蚀剂图像。