dimethyl-phenacyl sulfonium ; chloride | 7380-79-2

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: dimethyl-phenacyl sulfonium ; chloride
• 英文别名: Dimethylphenacylsulfonium chloride；dimethyl(phenacyl)sulfanium;chloride
• CAS: 7380-79-2
• 化学式: C₁₀H₁₃OS*Cl
• 分子量: 216.732
• InChiKey: WOQQSAPBYHHIDH-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  -1.25
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.3
• 拓扑面积：
  18.1
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  3,4-二羟基苯乙酮 、 dimethyl-phenacyl sulfonium ; chloride 在 selenium(IV) oxide 、 sodium carbonate 作用下， 以 乙腈 为溶剂， 反应 11.0h， 生成 2-(甲硫基)-1,4-二苯基丁-2-烯-1,4-二酮 、 (Z)-2-(methylthio)-1,4-diphenylbut-2-ene-1,4-dione
  参考文献：
  名称：

  Efficient Condensation between Glyoxal Hydrates and Sulfonium Salts Leading to Highly Functionalized 1,4-Diketones

  摘要：

  α-烷基硫代取代的α,β-不饱和1,4-二酮化合物，具有三种不同的功能，能够通过硫鎓盐与各种芳香或脂肪醛水合物的缩合反应，使用Na2SeO3或二氧化硒和Na2CO3的组合催化方便地合成。

  DOI：

  10.1055/s-2008-1078267
• 作为产物：
  描述：

  二甲基硫 、 alpha-氯乙酰苯 生成 dimethyl-phenacyl sulfonium ; chloride
  参考文献：
  名称：

  Boehme; Krause, Chemische Berichte, 1949, vol. 82, p. 426,431,432

  摘要：

  DOI：

文献信息

• PHOTODECOMPOSABLE BASES AND PHOTORESIST COMPOSITIONS
  申请人：Ayothi Ramakrishnan

  公开号：US20130052585A1

  公开（公告）日：2013-02-28

  Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.

  提供了一种新颖的对称和非对称的双功能光解基（PDBs），其具有二羧酸阴离子基团，显示出增强的成像性能。同时提供了使用双功能二羧化PDBs制备的光刻胶组合物和利用本发明的光刻胶组合物的光刻方法。
• [EN] FLUOROALCOHOL CONTAINING MOLECULAR PHOTORESIST MATERIALS AND PROCESSES OF USE<br/>[FR] MATÉRIAUX MOLÉCULAIRES DE RÉSINE PHOTOSENSIBLE CONTENANT UN ALCOOL FLUORÉ ET LEURS PROCÉDÉS D'UTILISATION
  申请人：IBM

  公开号：WO2012079919A1

  公开（公告）日：2012-06-21

  Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.

  含有至少一个氟醇单位的酚类分子玻璃，例如杯芳烃。这种含有氟醇的分子玻璃可以用于光刻胶组合物。本发明还揭示了使用光刻胶组合物在基板上生成抗蚀图像的方法。
• Low activation energy photoresists
  申请人：Allen David Robert

  公开号：US20050124774A1

  公开（公告）日：2005-06-09

  Polymers containing an acetal or ketal linkage and their use in lithographic photoresist compositions, particularly in chemical amplification photoresists, are provided. The polymer is prepared from at least one first olefinic monomer containing an acetal or ketal linkage, the acid-catalyzed cleavage of which renders the polymer soluble in aqueous base; and at least one second olefinic monomer selected from (i) an olefinic monomer containing a pendant fluorinated hydroxyalkyl group R H , (ii) an olefinic monomer containing a pendant fluorinated alkylsulfonamide group R S , and (iii) combinations thereof. The acetal or ketal linkage may be contained within an acid-cleavable substituent R CL in the first olefinic monomer. A method for using the photoresist compositions containing these polymers in preparing a patterned substrate is also provided in which the polymer is rendered soluble in aqueous base at a temperature of less than about 100° C. by acid-catalyzed deprotection of pendent acetal- or ketal-protected carboxylic acid groups.

  提供包含缩醛或缩酮键的聚合物及其在印刷光阻组合物中的使用，特别是在化学放大光阻中的使用。该聚合物由至少一个含有缩醛或缩酮键的第一烯丙基单体制备而成，酸催化裂解使聚合物在水性碱中溶解；以及至少一个第二烯丙基单体，选自（i）含有侧链氟代羟基烷基RH的烯丙基单体，（ii）含有侧链氟代烷基磺酰胺基团RS的烯丙基单体，以及（iii）其组合物。第一烯丙基单体中的缩醛或缩酮键可以包含在酸可裂解的取代基RCL中。还提供了一种使用这些聚合物的光阻组合物在制备图案化基板中的方法，其中通过酸催化去保护侧链缩醛或缩酮保护羧酸基团，使聚合物在低于约100°C的温度下在水性碱中溶解。
• Novel beta-oxo compounds and their use in photoresist
  申请人：ARCH SPECIALTY CHEMICALS, INC.

  公开号：US20030078354A1

  公开（公告）日：2003-04-24

  Polymers comprising monomeric units of acid sensitive (acid labile) monomers and from about 2 to about 20% by weight of monomeric units of &bgr;-oxo ester containing monomers, wherein the &bgr;-oxo ester containing monomers are free of lactams or lactones, are useful as binder resins in radiation sensitive photoresist compositions for producing a resist image on a substrate.

  含有酸敏感（易酸解）单体单位和约2至约20%重量的β-氧酮酯单体单位的高分子聚合物，其中β-氧酮酯单体单位不含内酰胺或内酯，可用作辐射敏感的光刻胶组合物中的粘合剂树脂，用于在基板上产生抗蚀图像。
• (Oxo)sulfonium complex, polymerizable composition containing the
  申请人：Toyo Ink Manufacturing Co., Ltd.

  公开号：US05500453A1

  公开（公告）日：1996-03-19

  A sulfonium complex or oxosulfonium complex of the formula (1), ##STR1## wherein R.sup.1 is a benzyl group, a substituted benzyl group, a phenacyl group, a substituted phenacyl group, an aryloxy group, a substituted aryloxy group, an alkenyl group or a substituted alkenyl group, each of R.sup.2 and R.sup.3 is independently any one of groups defined as R.sup.1, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, a substituted aralkyl group, an alkynyl group, a substituted alkynyl group, an alicyclic group, a substituted alicyclic group, an alkoxyl group, a substituted alkoxyl group, an alkylthio group, a substituted alkylthio group, an amino group or a substituted amino group, or R.sup.2 and R.sup.3 may bond together forming a ring structure, R.sup.4 is an oxygen atom or lone pair, and each of R.sup.5, R.sup.6, R.sup.7 and R.sup.8 is independently an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, a substituted aralkyl group, an alkenyl group or a substituted alkenyl group, provided that not all of R.sup.5, R.sup.6, R.sup.7 and R.sup.8 are aryl groups or substituted aryl groups.

  化合物的分子式为（1）的磺鎵化合物或氧磺鎵化合物，其中，R.sup.1是苄基、取代苄基、苯乙基、取代苯乙基、芳氧基、取代芳氧基、烯基或取代烯基中的任一种，R.sup.2和R.sup.3各自独立地是定义为R.sup.1、烷基、取代烷基、芳基、取代芳基、芳基烷基、取代芳基烷基、炔基、取代炔基、脂环基、取代脂环基、烷氧基、取代烷氧基、烷硫基、取代烷硫基、氨基或取代氨基中的任何一种，或者R.sup.2和R.sup.3可以结合形成环状结构，R.sup.4是氧原子或孤对电子，R.sup.5、R.sup.6、R.sup.7和R.sup.8各自独立地是烷基、取代烷基、芳基、取代芳基、芳基烷基、取代芳基烷基、烯基或取代烯基，前提是R.sup.5、R.sup.6、R.sup.7和R.sup.8中并非全部是芳基或取代芳基。