sodium 2-(bicyclo[2.2.1]heptan-2-yl)-1,1,2,2-tetrafluoroethane sulfonate | 474516-55-7

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: sodium 2-(bicyclo[2.2.1]heptan-2-yl)-1,1,2,2-tetrafluoroethane sulfonate
• 英文别名: Sodium 1,1,2,2-tetrafluoro-2-(norbornan-2-yl)ethanesulfonate；sodium;2-(2-bicyclo[2.2.1]heptanyl)-1,1,2,2-tetrafluoroethanesulfonate
• CAS: 474516-55-7
• 化学式: C₉H₁₁F₄O₃S*Na
• 分子量: 298.234
• InChiKey: JXOZYYYEKZPLDW-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  -0.8
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  65.6
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为反应物：
  描述：

  1-(naphthalen-2-yl)tetrahydrothiophenium methanesulfonate 、 sodium 2-(bicyclo[2.2.1]heptan-2-yl)-1,1,2,2-tetrafluoroethane sulfonate 以 二氯甲烷 、 水 为溶剂， 反应 12.0h， 生成 1-(naphthalen-2-yl)tetrahydrothiophenium 2-(bicyclo[2.2.1]heptan-2-yl)-1,1,2,2-tetrafluoroethane sulfonate
  参考文献：
  名称：

  EP1586570

  摘要：

  公开号：

文献信息

• Radiation-sensitive resin composition
  申请人：——

  公开号：US20030170561A1

  公开（公告）日：2003-09-11

  A radiation-sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a photoacid generator containing trifluoromethane sulfonic acid or a compound which generates an acid of the following formula (I), 1 wherein Rf individually represents a fluorine atom or a trifluoromethyl group, and Ra represents a hydrogen atom, a fluorine atom, a linear or branched alkyl group having 1-20 carbon atoms, or a linear or branched fluoroalkyl group having 1-20 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3-20 carbon atoms, or a substituted or unsubstituted monovalent cyclic fluoro-hydrocarbon group having 3-20 carbon atoms. The radiation-sensitive resin composition of the present invention exhibits superior resolution, while maintaining high transparency to radiations and high dry etching resistance. The resin composition thus can greatly contribute to the lithography process that will become more and more minute in the future.

  一种辐射敏感的树脂组合物，包括（A）含有酸可解离基团的聚硅氧烷和（B）含有三氟甲烷磺酸或生成以下式（I）酸的化合物的光酸发生剂，其中Rf分别表示氟原子或三氟甲基基团，Ra表示氢原子，氟原子，具有1-20个碳原子的线性或支链烷基，或具有1-20个碳原子的线性或支链氟烷基，具有3-20个碳原子的取代或未取代的单价环烃基或具有3-20个碳原子的取代或未取代的单价环氟烃基。本发明的辐射敏感树脂组合物表现出优异的分辨率，同时保持对辐射的高透明度和高干法刻蚀抵抗力。因此，该树脂组合物可以为未来变得越来越微小的光刻工艺做出巨大贡献。
• Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions
  申请人：Miyamatsu Takashi

  公开号：US20060141383A1

  公开（公告）日：2006-06-29

  A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R 1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR 3 group, wherein R 3 is a monovalent alicyclic hydrocarbon group, R 2 represents a (substituted)-alkyl group or two or more R 2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X − indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

  一种亚砜盐化合物，在波长为220纳米或更短的深紫外线下具有优异的透明度，当用作光酸发生剂时，表现出良好的性能平衡，如灵敏度、分辨率、图案形态、LER和储存稳定性。该光酸发生剂包含亚砜盐化合物，且包含该光酸发生剂的正电调辐射敏感树脂组成物。该亚砜盐化合物由以下公式(I)表示，其中R1表示卤素原子、烷基、一价脂环烃基、烷氧基或-OR3基，其中R3为一价脂环烃基，R2表示(取代)-烷基或两个或更多的R2基形成环状结构，p为0-7，q为0-6，n为0-3，X-表示磺酸根离子。该正电调辐射敏感树脂组成物包括(A)亚砜盐化合物的光酸发生剂和(B)含酸可解离基团的树脂。
• Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition
  申请人：JSR Corporation

  公开号：US07371503B2

  公开（公告）日：2008-05-13

  A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X− indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

  一种亚砜盐化合物，在220纳米或更短波长的深紫外线下具有优异的透明性，作为光酸发生剂使用时，表现出良好的性能平衡，如灵敏度、分辨率、图案形成、LER和储存稳定性。该光酸发生剂包含上述亚砜盐化合物，并且还包括含有该光酸发生剂的正电调辐射敏感树脂组合物。该亚砜盐化合物的化学式(I)如下所示：其中，R1代表卤素原子、烷基、一价脂环烃基、烷氧基或—OR3基，其中R3为一价脂环烃基，R2代表（取代）烷基或两个或更多的R2基形成环状结构，p为0-7，q为0-6，n为0-3，X-表示磺酸盐阴离子。该正电调辐射敏感树脂组合物包括（A）上述亚砜盐化合物的光酸发生剂和（B）含有酸可解离基团的树脂。
• POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1398339A1

  公开（公告）日：2004-03-17

  A novel polysiloxane having high transparency to radiations with a wavelength of 193 nm or less, particularly 157 nm or less, and exhibiting superior dry etching resistance and a radiation-sensitive resin composition comprising the polysiloxane exhibiting superior sensitivity, resolution, and the like are provided. The polysiloxane is a resin having the structural unit (I) and/or structural unit (II) of the following formula (1), and having an acid-dissociable group, wherein R1 represents a monovalent aromatic group substituted with a fluorine atom or a fluoroalkyl group or a monovalent aliphatic group substituted with a fluorine atom or a fluoroalkyl group and R2 represents the above a monovalent aromatic group, the above monovalent aliphatic group, a hydrogen atom, a monovalent hydrocarbon group, haloalkyl group, or amino group. The radiation-sensitive resin composition (A) comprises the polysiloxane (A) and the photoacid generator (B) .

  本发明提供了一种新型聚硅氧烷，该聚硅氧烷对波长为 193 纳米或以下，特别是 157 纳米或以下的辐射具有高透明度，并具有优异的耐干蚀刻性，还提供了一种包含该聚硅氧烷的辐射敏感树脂组合物，该组合物具有优异的灵敏度、分辨率等。该聚硅氧烷是一种具有下式（1）的结构单元（I）和/或结构单元（II），并具有酸可分解基团的树脂、 其中，R1 代表被氟原子或氟烷基取代的一价芳香族基团或被氟原子或氟烷基取代的一价脂肪族基团，R2 代表上述一价芳香族基团、上述一价脂肪族基团、氢原子、一价烃基、卤代烷基或氨基。辐射敏感树脂组合物（A）包括聚硅氧烷（A）和光酸发生器（B）。
• SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS
  申请人：JSR Corporation

  公开号：EP1586570A1

  公开（公告）日：2005-10-19

  A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or -OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X- indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

  一种锍盐化合物，对波长 220 纳米以下的深紫外线具有优异的透明性，用作光酸发生器时，在灵敏度、分辨率、图案形状、LER 和储存稳定性等方面表现出均衡的优异性能；一种包含该锍盐化合物的光酸发生器；以及一种包含该光酸发生器的正色调辐射敏感树脂组合物。 锍盐化合物如下式（I）所示、 其中 R1 代表卤素原子、烷基、一价脂环烃基、烷氧基或 -OR3 基团，其中 R3 是一价脂环烃基，R2 代表（取代的）烷基或两个或多个 R2 基团形成环状结构，p 是 0-7，q 是 0-6，n 是 0-3，X- 表示磺酸阴离子。 正色调辐射敏感树脂组合物包括 (A) 锍盐化合物的光酸发生器和 (B) 含酸可分解基团的树脂。