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2-Norpinanol, 3,6,6-trimethyl-

中文名称
——
中文别名
——
英文名称
2-Norpinanol, 3,6,6-trimethyl-
英文别名
3,6,6-trimethylbicyclo[3.1.1]heptan-2-ol
2-Norpinanol, 3,6,6-trimethyl-化学式
CAS
——
化学式
C10H18O
mdl
——
分子量
154.25
InChiKey
DODVNKCHFWJRHU-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.4
  • 重原子数:
    11
  • 可旋转键数:
    0
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    20.2
  • 氢给体数:
    1
  • 氢受体数:
    1

文献信息

  • Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    申请人:Yoshida Isao
    公开号:US20070027336A1
    公开(公告)日:2007-02-01
    The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ≡O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R 10 and R 20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A + represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).
    本发明提供了一种具有公式(L)的盐:其中Q代表—CO—基团或—C(OH)—基团;环X代表具有3至30个碳原子的单环或多元环烃基团,当Q是—C(OH)—基团时,在Q位置的氢原子被羟基取代,或者当Q是—CO—基团时,在Q位置的两个氢原子被≡O基团取代,并且单环或多元环烃基团中的至少一个氢原子可以可选地被具有1至6碳原子的烷基、具有1至6碳原子的烷氧基、具有1至4碳原子的全氟烷基、具有1至6碳原子的羟基烷基、羟基或氰基取代;R10和R20各自独立地代表氟原子或具有1至6碳原子的全氟烷基;A+代表有机反离子。本发明还提供了一种包含公式(L)的盐的化学放大抗蚀剂组合物。
  • Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
    申请人:Harada Yukako
    公开号:US20080081293A1
    公开(公告)日:2008-04-03
    The present invention provides a salt represented by the formula (I): wherein P 1 , P 2 and P 3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, provided that all of P 1 , P 2 and P 3 are not simultaneously phenyl groups which may be substituted, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and R represents a group represented by the formula: wherein A 1 represents —OH or —Y 1 —OH, n represents an integer of 1 to 9, and Y 1 represents a divalent C1-C6 saturated aliphatic hydrocarbon group; a group represented by the formula: wherein ring X 1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —CO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 2 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which a hydrogen atom of one —CH 2 — group is substituted with a hydroxyl group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 3 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —COO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group, and m represents an integer of 0 to 12; or a group represented by the formula: wherein ring X 4 represents a C6-C30 polycyclic hydrocarbon group having tricycle or more, and at least one hydrogen atom in the polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group or a cyano group, and l represents an integer of 1 to 12. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).
    本发明提供了一种盐,其表示为公式(I):其中P1、P2和P3各自独立地表示一个C1-C30烷基基团,该基团可以被至少一个羟基、一个C3-C12环烃基团和一个C1-C12烷氧基中的至少一个取代,或者一个C3-C30环烃基团,该基团可以被至少一个羟基和一个C1-C12烷氧基中的至少一个取代,前提是P1、P2和P3均不同时为可以被取代的苯基;Q1和Q2各自独立地表示氟原子或者C1-C6全氟烷基基团,R表示由以下公式表示的一个基团:其中A1表示—OH或—Y1—OH,n表示1到9之间的整数,Y1表示二价的C1-C6饱和脂肪族碳氢基团;一个由以下公式表示的基团:其中环X1表示一个C3-C30的单环或多环碳氢基团,其中一个—CH2—基团被—CO—取代,并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代;一个由以下公式表示的基团:其中环X2表示一个C3-C30的单环或多环碳氢基团,其中一个—CH2—基团的氢原子被羟基取代,并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代;一个由以下公式表示的基团:其中环X3表示一个C3-C30的单环或多环碳氢基团,其中一个—CH2—基团被—COO—取代,并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代,m表示0到12之间的整数;或者一个由以下公式表示的基团:其中环X4表示一个具有三环或更多的C6-C30多环碳氢基团,多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团或氰基取代,l表示1到12之间的整数。本发明还提供了一种化学增感抗蚀组合物,其包含上述公式(I)表示的盐。
  • CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
    申请人:Kamabuchi Akira
    公开号:US20090286937A1
    公开(公告)日:2009-11-19
    The present invention provides a chemically amplified positive composition comprising a resin which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R 1 represents a hydrogen atom etc., R′ and R″ are independently a hydrogen atom etc., k represents an integer of 1 to 12, R is independently a C1-C6 alkyl group etc. and x represents an integer of 0 to 7, and an acid generator represented by the formula (V): wherein Y 1 and Y 2 each independently represent a fluorine atom etc., R12 represents a C1-C30 linear, branched chain or cyclic hydrocarbon group which may be substituted, and A + represents an organic counter ion.
    本发明提供了一种化学增感正性组合物,包括一个树脂,该树脂包括一个侧链中含有酸敏感基团的结构单元和一个由式(I)表示的结构单元:其中R1代表氢原子等,R'和R"各自独立地代表氢原子等,k表示1到12的整数,R独立地代表C1-C6烷基等,x表示0到7的整数,以及由式(V)表示的酸发生剂:其中Y1和Y2各自独立地代表氟原子等,R12代表C1-C30线性、支链或环烃基,可以被取代,A+代表有机对离子。
  • A salt suitable for an acid generator and a chemically amplified resist composition containing the same
    申请人:Sumitomo Chemical Company, Limited
    公开号:EP1873143B1
    公开(公告)日:2009-04-15
  • CHEMICALLY AMPLIFIED RESIST COMPOSITION
    申请人:YAMAGUCHI Satoshi
    公开号:US20080220369A1
    公开(公告)日:2008-09-11
    The present invention provides a chemically amplified resist composition containing: (A) a salt represented by the formula (I): A +− O 3 S-Q 1 (I) wherein A+ and Q 1 are defined in the specification; (B) a salt represented by the formula (II): wherein R 22 , A 3 , A 4 and A′ + are defined in the specification; and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
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