6-chloro-2-oxohexahydro-2H-3,5-methanocyclopenta[b]furan-7-carboxylic acid

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 6-chloro-2-oxohexahydro-2H-3,5-methanocyclopenta[b]furan-7-carboxylic acid
• 英文别名: 2-chloro-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-9-carboxylic acid
• 化学式: C₉H₉ClO₄
• mdl: MFCD01113679
• 分子量: 216.62
• InChiKey: ZCJNJGNVUGMXST-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  63.6
• 氢给体数：
  1
• 氢受体数：
  4

文献信息

• Conductive material and substrate
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10023752B2

  公开（公告）日：2018-07-17

  The present invention provides a conductive material including: (A) a π-conjugated polymer, (B) a dopant polymer which contains one or more repeating units selected from “a1” to “a4” respectively shown by the following general formula (1) and has a weight-average molecular weight in the range of 1,000 to 500,000, and (C) one or more salts selected from the group consisting of a monovalent copper salt of carboxylic acid, a monovalent copper salt of β-diketone, and a monovalent copper salt of β-ketoester. There can be provided a conductive material that has excellent film-formability and also can form a conductive film having high transparency and conductivity, superior flexibility and flatness when the film is formed from the material.

  本发明提供了一种导电材料，包括(A) π-共轭聚合物；(B) 掺杂聚合物，其含有一个或多个如下通式(1)所示分别选自 "a1 "至 "a4 "的重复单元，且其重量平均分子量在 1,000 至 500,000 之间；以及 (C) 一种或多种盐，其选自由羧酸的一价铜盐、β-二酮的一价铜盐和β-酮酯的一价铜盐组成的组。本发明可提供一种导电材料，该材料具有优异的成膜性，并可形成具有高透明度和导电性的导电薄膜，在由该材料形成薄膜时，还具有优异的柔韧性和平整度。
• Resist composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10474030B2

  公开（公告）日：2019-11-12

  A resist composition comprising a base polymer and a metal salt of carboxylic acid or sulfonamide is provided, the metal being selected from calcium, strontium, barium, cerium, aluminum, indium, gallium, thallium scandium, and yttrium. The resist composition exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.

  本发明提供了一种抗蚀剂组合物，它由基质聚合物和羧酸或磺酰胺的金属盐组成，金属选自钙、锶、钡、铈、铝、铟、镓、铊钪和钇。抗蚀剂组合物具有敏化效果和酸扩散抑制效果，并能形成具有更高分辨率、LWR 和 CDU 的图案。
• SCREENING METHODS FOR AMYLOID BETA MODULATORS
  申请人：Slon-Usakiewicz Jacek

  公开号：US20110028719A1

  公开（公告）日：2011-02-03

  The present invention relates to methods for screening, identifying, and/or quantifying modulators of amyloid and/or aggregates, fibrils or components thereof, in particular modulators of amyloid β-peptide (Aβ) or Aβ fibrils. Aspects of the invention provide methods for screening putative modulators against an Amyloid target, in particular an Aβ target, so as to determine which modulators bind to or interact with the target, or interfere with the interaction of an indicator agent and the target. Particular aspects of the invention employ mass spectrometric methods for the screening of an Amyloid target against compound libraries, in particular mixtures of compounds or combinatorial libraries.
• CONDUCTIVE MATERIAL AND SUBSTRATE
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170130070A1

  公开（公告）日：2017-05-11

  The present invention provides a conductive material including: (A) a π-conjugated polymer, (B) a dopant polymer which contains one or more repeating units selected from “a1” to “a4” respectively shown by the following general formula (1) and has a weight-average molecular weight in the range of 1,000 to 500,000, and (C) one or more salts selected from the group consisting of a monovalent copper salt of carboxylic acid, a monovalent copper salt of β-diketone, and a monovalent copper salt of β-ketoester. There can be provided a conductive material that has excellent film-formability and also can form a conductive film having high transparency and conductivity, superior flexibility and flatness when the film is formed from the material.
• RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20180101094A1

  公开（公告）日：2018-04-12

  A resist composition comprising a base polymer and a metal salt of carboxylic acid or sulfonamide is provided, the metal being selected from calcium, strontium, barium, cerium, aluminum, indium, gallium, thallium scandium, and yttrium. The resist composition exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.