Mechanism Selection for Regiocontrol in Base-Assisted, Palladium-Catalysed Direct CH Coupling with Halides: First Approach for Oxazole- and Thiazole-4-Carboxylates
作者:Laure Théveau、Cécile Verrier、Pierrik Lassalas、Thibaut Martin、Georges Dupas、Olivier Querolle、Luc Van Hijfte、Francis Marsais、Christophe Hoarau
DOI:10.1002/chem.201101615
日期:2011.12.16
Both base‐assisted non‐concerted metallation–deprotonation (nCMD) and concerted metallation–deprotonation (CMD) have been identified as two potent operating mechanisms in palladium‐catalysed direct CH coupling of oxazole and thiazole‐4‐carboxylate esters with halides through base‐ and solvent‐effect experiments. Novel C2‐ and C5‐selective CMD direct arylation procedures in oxazole‐ and thiazole‐4‐carboxylate
两个基地辅助非一致金属化-去质子化(NCMD)和协同金属化-去质子化(CMD)已被确定为在钯催化的直接C上两个有效的操作机构通过与卤化物恶唑的耦合和噻唑-4-羧酸酯ħ碱和溶剂效应实验。然后通过控制电子和空间因素之间的平衡,设计了恶唑和噻唑-4-羧酸酯系列中新颖的C2和C5选择性CMD直接芳基化方法。值得注意的是,钯催化剂和底物之间的电荷相互作用被确定为控制选择性和减少CMD反应中空间因素的影响的参数。