申请人:——
公开号:US20010041778A1
公开(公告)日:2001-11-15
This invention relates to a composition of matter represented by the formula below, and to a polymerization process comprising combining an olefin in the gas or slurry phase with an activator, a support and a compound represented by the following formula:
1
wherein
M is a group 3 to 14 metal,
each X is independently an anionic leaving group,
n is the oxidation state of M,
m is the formal charge of the YZL ligand,
Y is a group 15 element,
Z is a group 15 element,
L is a group 15 or 16 element,
R
1
and R
2
are independently a C
1
to C
20
hydrocarbon group, a heteroatom containing group, silicon, germanium, tin, lead, phosphorus, a halogen,
R
1
and R
2
may also be interconnected to each other,
R
3
is absent, or is hydrogen, a group 14 atom containing group, a halogen, a heteroatom containing group,
R
4
and R
5
are independently an aryl group, a substituted aryl group, a cyclic alkyl group, a substituted cyclic alkyl group, or multiple ring system,
R
6
and R
7
are independently absent or hydrogen, halogen, a heteroatom or a hydrocarbyl group, or a heteroatom containing group.
这项发明涉及一种由以下公式表示的物质组合,以及包括将烯烃与活化剂、支撑物和以下公式所代表的化合物组合在气相或浆相中的聚合过程:
其中M是3到14族金属,每个X独立是一个离去的阴离子基团,n是M的氧化态,m是YZL配体的形式电荷,Y是15族元素,Z是15族元素,L是15或16族元素,R1和R2独立是C1到C20烃基、含杂原子的基团、硅、锗、锡、铅、磷、卤素,R1和R2也可能相互连接,R3不存在,或者是氢、含14族原子的基团、卤素、含杂原子的基团,R4和R5独立是芳基、取代芳基、环烷基、取代环烷基或多环系统,R6和R7独立缺席或是氢、卤素、杂原子或烃基团,或含杂原子的基团。