The invention provides a resist composition comprising a polymer (a) having groups cleavable by an acid and a compound (b) which can form an acid upon exposure to active rays, wherein the polymer (a) is a polymer having, as the groups cleavable by an acid, groups containing a substituted allyloxy group having at least two substituents, and a resist composition comprising a resin binder (A), a compound (B) which can form an acid upon exposure to active rays, and a compound (C) having a group cleavable by an acid, wherein the compound (C) having the group cleavable by an acid is a compound having a group containing a substituted allyloxy group having at least one substituent. The resist compositions have excellent sensitivity, resolution and heat resistance and can provide excellent pattern form.
本发明提供了一种抗蚀组合物,包括聚合物(a)和一种化合物(b),其中聚合物(a)具有可被酸分解的基团,化合物(b)在暴露于活性射线时能够形成酸。聚合物(a)是具有可被酸分解的基团的聚合物,该基团包含至少两个取代烯丙氧基团,抗蚀组合物包括
树脂粘合剂(A)、一种化合物(B),在暴露于活性射线时能够形成酸,以及一种具有可被酸分解基团的化合物(C),其中具有可被酸分解基团的化合物(C)是一种含有至少一个取代烯丙氧基团的化合物。该抗蚀组合物具有优异的敏感性、分辨率和耐热性,并能提供优异的图案形态。