Action des organomagnésiens sur les composés β-dicarbonylés V. Synthèses de β-diols bitertiaires à partir de β-hydroxycétones. Induction asymétrique 1-3
Eichenauer,H. et al., Angewandte Chemie, 1978, vol. 90, p. 219 - 220
作者:Eichenauer,H. et al.
DOI:——
日期:——
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERNS BY USING THE SAME
申请人:LIU Chi-Ming
公开号:US20120328799A1
公开(公告)日:2012-12-27
A photosensitive resin composition and a method for forming patterns by using the same are disclosed. The photosensitive resin composition comprises a novolac resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B) and a ketol solvent (C). The novolac resin (A) includes a high-ortho novolac resin (A-1) that has ortho-ortho methylene bonding to all methylene bonding in a ratio of 18% to 25%, and a weight ratio (A-1)/(C) of the high-ortho novolac resin (A-1) to the ketol solvent (C) is 0.1 to 2.0, thereby exhibiting excellent temporal stability and further forming patterns with superior film to thickness uniformity and high resolution.