[EN] DEPOSITION PROCESSES USING GROUP 8 (VIII) METALLOCENE PRECURSORS [FR] PROCEDES DE DEPOTS METTANT EN OEUVRE DES PRECURSEURS METALLOCENES DE GROUPE 8 (VIII)
Metal complexes for chemical vapour deposition of platinum
申请人:Doppelt Pascal
公开号:US08604231B2
公开(公告)日:2013-12-10
The invention relates to platinum complexes, to a method for preparing the same and to the use thereof for the chemical vapor deposition of metal platinum. The chemical vapor deposition of platinum onto a substrate is made from a platinum organo-metal compound the includes a ligand with a cyclic structure including at least two non-adjacent C═C double bonds, and the platinum organo-metal compound has a square-lane structure in which the platinum is bonded to each of the C═C double bonds of the ligand, thereby forming a (C═C)—Pt—(C═C) of 60° to 70°.
Electrochemical synthesis of π-cyclopentadienyl(nitrosyl)nickel complexes
作者:V. L. Shirokii、V. A. Knizhnikov、A. B. Sutormin、N. A. Maier、Yu. A. Andrianov、L. G. Sedova
DOI:10.1007/bf01558081
日期:1994.6
The dependence of the yield of π-cyclopentadienyl(nitrosyl)nickel on the conditions of its electrochemical synthesis from cyclopentadiene under an atmosphere of nitric oxide has been studied with the use of a nickel anode. The general character of the reaction has been demonstrated by its extention to monosubstituted ethyl-, isopropyl-, and benzoylcyclopentadienes.
Synthesis of mono-substituted alkylcyclopentadienes by mixing alkyl iodides with cyclopentadienyl magnesium chloride in tetrahydrofuran is described.
描述了通过在四氢呋喃中混合烷基碘化物和环戊二烯基氯化镁合成单取代烷基环戊二烯的方法。
BIS(ALKYLTETRAMETHYLCYCLOPENTADIENYL)ZINC, PRECURSOR FOR CHEMICAL VAPOR DEPOSITION, AND PRODUCTION METHOD FOR ZINC-CONTAINING THIN FILM
申请人:KOJUNDO CHEMICAL LABORATORY CO., LTD.
公开号:US20210163519A1
公开(公告)日:2021-06-03
Provided is a precursor for chemical vapor deposition for depositing a zinc-containing thin film. Bis(alkyltetramethylcyclopentadienyl)zinc represented by the formula (1) which is liquid at room temperature and is therefore easy to handle (in the formula (1), R
1
and R
2
are alkyl group having 3 carbon atoms); a precursor for chemical vapor deposition comprising bis(alkyltetramethylcyclopentadienyl)zinc represented by the formula (2) (in the formula (2), R
3
and R
4
are alkyl group having 2-5 carbon atoms); and a production method for a zinc-containing thin film through chemical vapor deposition.