[EN] DITHIOLANE COMPOUNDS; COMPOSITIONS CONTAINING THEM; USES FOR PHOTOPROTECTING THE SKIN<br/>[FR] COMPOSÉS DE DITHIOLANE ; COMPOSITIONS LES CONTENANT, LEURS UTILISATIONS POUR LA PHOTOPROTECTION DE LA PEAU
申请人:OREAL
公开号:WO2010040603A1
公开(公告)日:2010-04-15
The present invention relates to novel dithiolane compounds of formula (I) below: formula (I), in which Y denotes 0, NR1 or S; R1 denotes a hydrogen atom; a saturated linear C1-C20 or branched C3-C20 or unsaturated C2-C20 alkyl hydrocarbon- based group; an aryl group optionally substituted with one or more hydroxyls and/or with one or more C1-C8 alkoxy radicals; R denotes a hydrogen atom; a saturated linear C1-C20 or branched C3-C20 or unsaturated C2-C20 alkyl hydrocarbon- based group; a radical having the following formula (Ia), in which n = 0, 1, 2, 3 or 4; x = 0, 1, 2 or 3 and R3, which may be identical or different, denote a hydrogen atom or a linear or branched C1-C4 alkyl such as methyl, ethyl or isopropyl; the radical 4-methyl dithiolane when Y denotes NH; when Y denotes NHR1 and R1 is other than hydrogen, R and Ri may form a ring. The invention also relates to the uses of these compounds for reinforcing the natural antioxidant protection of the skin against oxidative stress caused especially by UV radiation.
本发明涉及以下式子(I)的新型二硫杂环化合物:式子(I),其中Y表示0、NR1或S;R1表示氢原子;基于饱和线性C1-C20或支链C3-C20或不饱和C2-C20烷基碳的基团;一种芳基,可选地带有一个或多个羟基和/或一个或多个C1-C8烷氧基;R表示氢原子;基于饱和线性C1-C20或支链C3-C20或不饱和C2-C20烷基碳的基团;一种具有以下式子(Ia)的基团,其中n = 0,1,2,3或4;x = 0,1,2或3,R3可能相同也可能不同,表示氢原子或线性或支链C1-C4烷基,如甲基、乙基或异丙基;当Y表示NH时,基团为4-甲基二硫杂环;当Y表示NHR1且R1不是氢时,R和Ri可以形成环。本发明还涉及这些化合物用于增强皮肤对氧化应激(尤其是紫外线辐射引起的)的天然抗氧化保护的用途。