申请人:FUJIFILM Corporation
                            
                            
                                公开号:US20140121292A1
                            
                            
                                公开(公告)日:2014-05-01
                            
                            Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising at least one kind of polymerizable monomer selected from the following compounds and a photopolymerization initiator;