3,4-Epoxytricyclo(5.2.1.0 2,6)-decanol | 51020-94-1

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 3,4-Epoxytricyclo(5.2.1.0 2,6)-decanol
• 英文别名: 4-oxatetracyclo[6.2.1.02,7.03,5]undecan-10-ol
• CAS: 51020-94-1
• 化学式: C₁₀H₁₄O₂
• 分子量: 166.22
• InChiKey: HZGOREPCCSVKGA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  32.8
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
  申请人：Enomoto Yuichiro

  公开号：US20120282548A1

  公开（公告）日：2012-11-08

  Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

  提供的是一种形成图案的方法，包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤，(ii)曝光薄膜的步骤，以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤，其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂，(B)一种能够在光致或辐射照射下生成酸的化合物，(D)一种溶剂，以及(G)一种具有氟原子和硅原子中的至少一种，并具有碱性或能够通过酸的作用增加碱性的化合物。
• PHOTOSENSITIVE RESIN COMPOSITION, CONDUCTIVE WIRE PROTECTION FILM, AND TOUCH PANEL MEMBER
  申请人：Toray Industries, Inc.

  公开号：EP2871522A1

  公开（公告）日：2015-05-13

  The present invention aims to provide an alkali-developable negative-tone photosensitive resin composition that is extremely excellent in storage stability while having properties such as high hardness, high transparency, high heat resistance, and high chemical resistance. The present invention provides a photosensitive resin composition comprising an unsaturated group-containing resin (D), a (meth)acrylic compound (E) having a specific structure, a silane compound (G) having a substituent selected from the group consisting of an amino group, an amide group, a ureido group, a ketimine group, and an isocyanate group, and a photo-polymerization initiator (F), the unsaturated group-containing resin (D) being obtained by adding an epoxy group-containing unsaturated compound (C) to some acid radicals of a copolymer obtained by copolymerizing a (meth)acrylic ester (A) with an unsaturated group- and acid-containing compound (B).

  本发明旨在提供一种贮存稳定性极佳，同时具有高硬度、高透明度、高耐热性和高耐化学腐蚀性等特性的碱性显影负调感光树脂组合物。本发明提供了一种感光树脂组合物，包括含不饱和基团的树脂 (D)、具有特定结构的（甲基）丙烯酸化合物 (E)、具有选自氨基、酰胺基、脲基、酮亚胺基和异氰酸酯基取代基的硅烷化合物 (G)、含不饱和基团的树脂 (D) 是通过将含环氧基团的不饱和化合物 (C) 加入到通过共聚 (甲基) 丙烯酸酯 (A) 和含不饱和基团和酸的化合物 (B) 所得到的共聚物的一些酸基中而得到的。
• POLYESTER COMPOSITIONS WITH LOW GEL CONTENT AND METHOD OF MAKING THEM
  申请人：Mediratta Gaurav

  公开号：US20080125518A1

  公开（公告）日：2008-05-29

  A polyester resin composition comprising structural units derived from (i) a polyester having end groups and at least about 20 percent of acid end groups relative to a total number of the end groups;” and (ii) at least one bis epoxy compound having two epoxy groups, and wherein the bis epoxy compound does not have an ester or carbonate groups; and, wherein the polyester has a gel content in a range from about 0 to about 10 percent is disclosed. Also disclosed is a process to prepare these compositions and articles therefrom.
• ACTIVE ENERGY RAY-CURABLE COMPOSITION, ACTIVE ENERGY RAY-CURABLE INK COMPOSITION AND INKJET RECORDING METHOD
  申请人：KYOTA Hirokazu

  公开号：US20100247796A1

  公开（公告）日：2010-09-30

  The present invention provides an active energy ray-curable composition containing: a compound configured to generate an acid upon irradiation with active energy rays; and a cationic polymerizable monomer, the cationic polymerizable monomer containing a polyfunctional oxirane compound having, in a molecule, one bicyclo ring skeleton or tricyclo ring skeleton having at least one oxygen atom in the ring, provided that 3-membered rings and 4-membered rings containing oxygen atoms are not included in the ring structure of the bicyclo ring skeleton or tricyclo ring skeleton, and the polyfunctional oxirane compound carrying two or more oxirane rings.
• AROMATIC POLYAMIDE FILMS FOR SOLVENT RESISTANT FLEXIBLE SUBSTRATES
  申请人：SUN LIMIN

  公开号：US20130011642A1

  公开（公告）日：2013-01-10

  Films with optical transmittance of >80% between 400 and 750 nm and with CTEs less than 20 ppm/° C. are prepared from aromatic polyamides that are soluble in polar organic solvents yet have Tgs >300° C. The films are crosslinked in the solid state by heating at elevated temperatures for short periods of time in the presence of multifunctional epoxides. Surprisingly, the optical and thermal properties of the films do not change significantly during the curing process. The temperature required for the crosslinking process to take place can be reduced by the presence of a few free, pendant carboxyl groups along the polyamide backbones. The films are useful as flexible substrates for electronic displays and photovoltaic devices.