申请人:Shibuya Akira
公开号:US20080085251A1
公开(公告)日:2008-04-10
Provided are hair processing agents capable of permanent waving hair even at a neutral to weakly acidic pH range that causes less irritation to the skin, and hair processing agents in which an unpleasant odor is masked. Hair processing agents contain at least one compound represented by the formula (2). Hair processing agents contain a compound of the formula (2) and at least one compound (ii) selected from thioglycolic acid, thiolactic acid, cysteine, acetylcysteine, cysteamine, acylcysteamine, salts thereof and ester derivatives thereof. Hair processing agents contain a compound of the formula (2), a surfactant and water, and are emulsified. Hair processing agents contain a compound of the formula (2) and a specific perfume. wherein X is a structure selected from —O—, —S—, —NH— and —NR
1
—; R
1
is an alkyl group of 1 to 6 carbon atoms; Y is an oxygen atom or a sulfur atom; in the formula (1), Z is a divalent organic residue having at least one mercapto group; in the formula (2), R is a divalent organic residue optionally having a mercapto group; and R
2
is a hydrogen atom or an alkyl group of 1 to 6 carbon atoms.
提供了能够在中性至微酸性pH范围内进行永久性卷发的头发处理剂,其对皮肤刺激较小,并且掩盖了不愉快的气味。头发处理剂包含至少一种由公式(2)表示的化合物。头发处理剂包含公式(2)的化合物和至少一种从巯基乙酸,巯基乳酸,半胱氨酸,乙酰半胱氨酸,半胱氨醇,酰基半胱氨醇,其盐和酯衍生物中选择的化合物(ii)。头发处理剂包含公式(2)的化合物,表面活性剂和水,并且是乳化的。头发处理剂包含公式(2)的化合物和特定香水。其中X是从-O-,-S-,-NH-和-NR1-选择的结构;R1是1到6个碳原子的烷基;Y是氧原子或硫原子;在公式(1)中,Z是具有至少一个巯基的二价有机残基;在公式(2)中,R是二价的有机残基,可选地具有巯基;R2是氢原子或1到6个碳原子的烷基。