申请人:Tokyo Ohka Kogyo Co., Ltd.
公开号:US20140178821A1
公开(公告)日:2014-06-26
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R
1
represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y
1
represents a single bond or a divalent linking group; R
2
and R
3
each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R
2
and R
3
may form a ring with Y
1
; M
m+
represents an organic cation having a valency of m; and m represents an integer of 1 or more.