1,1,1,3,3,3-Hexafluoro-2-[(5-methyl-6-pentan-2-yl-2-bicyclo[2.2.1]heptanyl)methyl]propan-2-ol

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 1,1,1,3,3,3-Hexafluoro-2-[(5-methyl-6-pentan-2-yl-2-bicyclo[2.2.1]heptanyl)methyl]propan-2-ol
• 英文别名: 1,1,1,3,3,3-hexafluoro-2-[(5-methyl-6-pentan-2-yl-2-bicyclo[2.2.1]heptanyl)methyl]propan-2-ol
• 化学式: C₁₇H₂₆F₆O
• 分子量: 360.4
• InChiKey: YRWXYQIGRRAFSN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.9
• 重原子数：
  24
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  7

文献信息

• PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160070174A1

  公开（公告）日：2016-03-10

  Disclosed is a pattern forming method including forming an active light sensitive or radiation sensitive film by coating a substrate with an active light sensitive or radiation sensitive resin composition; exposing the active light sensitive or radiation sensitive film; and forming a negative type pattern by developing the exposed active light sensitive or radiation sensitive film using a developer which includes an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) which includes a repeating unit (a) which has an acidic group and a lactone structure and of which, due to a polarity thereof being increased by an action of an acid, a solubility decreases with respect to a developer which includes an organic solvent.
• US8771916B2
  申请人：——

  公开号：US8771916B2

  公开（公告）日：2014-07-08
• US8846290B2
  申请人：——

  公开号：US8846290B2

  公开（公告）日：2014-09-30