COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER
申请人:JSR CORPORATION
公开号:US20140248563A1
公开(公告)日:2014-09-04
A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R
1
represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R
2
represents a single bond or a divalent organic group having 1 to 20 carbon atoms. R
3
represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R
Q
represents a perfluoroalkyl group having 1 to 5 carbon atoms. R
X
represents a hydrogen atom or a monovalent base-labile group.