2-[2-(1-Adamantyl)-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-9-carbonyl]oxy-3,3,3-trifluoro-2-(trifluoromethyl)propane-1-sulfonic acid

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-[2-(1-Adamantyl)-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-9-carbonyl]oxy-3,3,3-trifluoro-2-(trifluoromethyl)propane-1-sulfonic acid
• 英文别名: 2-[2-(1-adamantyl)-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-9-carbonyl]oxy-3,3,3-trifluoro-2-(trifluoromethyl)propane-1-sulfonic acid
• 化学式: C₂₃H₂₆F₆O₇S
• 分子量: 560.5
• InChiKey: CXCNCMJPCDBZIU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.9
• 重原子数：
  37
• 可旋转键数：
  6
• 环数：
  7.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  115
• 氢给体数：
  1
• 氢受体数：
  13

文献信息

• RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170184967A1

  公开（公告）日：2017-06-29

  A polymer comprising recurring units containing a specific lactone ring and having an alkyl group on γ-butyrolactone skeleton of fused ring lactone and an alkyl ester substituent group intervening between the lactone structure and the polymer backbone is provided. A resist composition comprising the polymer as base resin is improved in such properties as DOF margin and MEF and quite effective for precise micropatterning.

  提供一种聚合物，其中包含含有特定内酯环的重复单元，并且在融合环内酯的γ-丁内酯骨架上具有烷基基团，以及在内酯结构和聚合物主链之间具有烷基酯取代基团。以该聚合物为基础树脂的抗蚀组合物在DOF边缘和MEF等性能方面得到改善，并且非常有效用于精确微图案化。
• Resist composition, pattern forming process, polymer, and monomer
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10310376B2

  公开（公告）日：2019-06-04

  A polymer comprising recurring units containing a specific lactone ring and having an alkyl group on γ-butyrolactone skeleton of fused ring lactone and an alkyl ester substituent group intervening between the lactone structure and the polymer backbone is provided. A resist composition comprising the polymer as base resin is improved in such properties as DOF margin and MEF and quite effective for precise micropatterning.

  本发明提供了一种聚合物，它由含有特定内酯环的递归单元组成，在融合环内酯的 γ-丁内酯骨架上有一个烷基，在内酯结构和聚合物骨架之间有一个烷基酯取代基。以这种聚合物为基体树脂的抗蚀剂组合物在 DOF 余量和 MEF 等性能方面都有所改进，对精确微图案化非常有效。
• Resist composition and pattern forming process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10921710B2

  公开（公告）日：2021-02-16

  A polymer comprising units having a highly fused homoadamantane skeleton at side chain end bonded to the polymer backbone via a linking group has an appropriate solvent solubility and is capable of suppressing acid diffusion. A resist composition comprising the polymer and a specific photoacid generator exhibits a good DOF margin, CD uniformity, and a minimal CD change during PPD, and is quite effective in precise micropatterning.

  一种聚合物的侧链端含有高度融合的均金刚烷骨架单元，该单元通过连接基团与聚合物骨架键合，具有适当的溶剂溶解性，并能抑制酸扩散。由该聚合物和特定光酸发生器组成的抗蚀剂组合物在 PPD 过程中表现出良好的 DOF 余量、CD 一致性和最小的 CD 变化，在精确微图案化方面非常有效。
• RESIST COMPOSITION AND PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20190033715A1

  公开（公告）日：2019-01-31

  A polymer comprising units having a highly fused homoadamantane skeleton at side chain end bonded to the polymer backbone via a linking group has an appropriate solvent solubility and is capable of suppressing acid diffusion. A resist composition comprising the polymer and a specific photoacid generator exhibits a good DOF margin, CD uniformity, and a minimal CD change during PPD, and is quite effective in precise micropatterning.