申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:EP3285119A1
公开(公告)日:2018-02-21
The present invention provides a radiation-sensitive composition containing (A) a resist base material, (B) an optically active diazonaphthoquinone compound, and (C) a solvent, wherein the content of a solid component in the composition is within the range of 1 to 80% by mass, the content of the solvent is within the range of 20 to 99% by mass, and the resist base material (A) is a compound represented by a specific formula.
本发明提供了一种辐射敏感组合物,该组合物含有 (A) 抗蚀剂基材、(B) 光学活性重氮萘醌化合物和 (C) 溶剂,其中组合物中固体成分的含量在 1% 至 80% (按质量计)的范围内,溶剂的含量在 20% 至 99% (按质量计)的范围内,抗蚀剂基材 (A) 是由特定式表示的化合物。