[2-Oxo-2-[(5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl)oxy]ethyl] 2-tert-butyl-2,4,4-trimethylpentanoate

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: [2-Oxo-2-[(5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl)oxy]ethyl] 2-tert-butyl-2,4,4-trimethylpentanoate
• 英文别名: [2-oxo-2-[(5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl)oxy]ethyl] 2-tert-butyl-2,4,4-trimethylpentanoate
• 化学式: C₂₂H₃₄O₆
• 分子量: 394.5
• InChiKey: VUPAJUGNQLTSSJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.7
• 重原子数：
  28
• 可旋转键数：
  9
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  78.9
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20190112286A1

  公开（公告）日：2019-04-18

  A salt comprising a group represented by the formula (aa):

  一种由公式（aa）所表示的群组的盐：
• SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20200387069A1

  公开（公告）日：2020-12-10

  Disclosed are a salt represented by formula (1), and a quencher and a resist composition comprising the same: wherein R 1 , R 2 and R 3 each independently represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, and —CH 2 — included in the hydrocarbon group may be replaced by —O— or —CO—, m1, m2 and m3 represent an integer of 0 to 4, and when m1, m2 and/or m3 are 2 or more, a plurality of R 1 , a plurality of R 2 and/or a plurality of R 3 may be the same or different from each other, and X 1 represents —CO—, —SO— or —SO 2 —.

  公开了一种由式（1）表示的盐，以及包括该盐的淬灭剂和抗蚀组合物：其中R1、R2和R3分别独立表示卤素原子、具有1至6个碳原子的烷基氟基或具有1至18个碳原子的碳氢基，而包含在碳氢基中的—CH2—可被—O—或—CO—替代，m1、m2和m3代表0至4的整数，当m1、m2和/或m3为2或更多时，多个R1、多个R2和/或多个R3可能相同或不同，X1表示—CO—、—SO—或—SO2—。
• SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210255545A1

  公开（公告）日：2021-08-19

  Disclosed are a salt represented by formula (1), and an acid generator and a resist composition which include the same: wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.

  本发明涉及一种由式（1）表示的盐，以及包括该盐的酸发生剂和抗蚀组合物： 其中，R1代表氟原子或氟化烷基；R2、R3和R4各代表卤素原子、氟化烷基或烃基；m2和m3代表0到4的整数；m4代表0到5的整数；Q1和Q2各代表氟原子或全氟烷基；L1代表饱和烃基，其中包括在该基团中的-CH2-可被替换为-O-或-CO-，该基团中包括的氢原子可被氟原子或羟基取代；Y1代表可带有取代基的甲基基团或可带有取代基的脂环烃基团。
• Salt and photoresist composition containing the same
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US10882839B2

  公开（公告）日：2021-01-05

  A salt containing a group represented by the formula (aa): wherein Xa and Xb independently each represent an oxygen atom or a sulfur atom, a ring W represents a C3-C18 heterocycle which has a carbonate ester structure and which can have a substituent, and * represents a binding position is provided.

  含有式 (aa) 所代表基团的盐： 其中，Xa 和 Xb 各自独立地代表氧原子或硫原子，环 W 代表具有碳酸酯结构且可具有取代基的 C3-C18 杂环，* 代表结合位置。
• US9580402B2
  申请人：——

  公开号：US9580402B2

  公开（公告）日：2017-02-28