[3,5-Bis(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)cyclohexyl] 2,4-dimethyl-2-propan-2-ylpentanoate

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: [3,5-Bis(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)cyclohexyl] 2,4-dimethyl-2-propan-2-ylpentanoate
• 英文别名: [3,5-bis(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)cyclohexyl] 2,4-dimethyl-2-propan-2-ylpentanoate
• 化学式: C₂₂H₃₀F₁₂O₄
• 分子量: 586.5
• InChiKey: GRZPJWYPICURHG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.7
• 重原子数：
  38
• 可旋转键数：
  8
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.95
• 拓扑面积：
  66.8
• 氢给体数：
  2
• 氢受体数：
  16

文献信息

• Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device
  申请人：FUJIFILM Corporation

  公开号：US10246605B2

  公开（公告）日：2019-04-02

  Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

  本发明提供了一种用于底层成膜的树脂组合物、一种分层产品、一种图案形成方法、一种压印形成套件和一种设备生产工艺。 本发明公开了一种用于形成底层膜的树脂组合物，该组合物通过涂敷在基底材料上形成底层膜，包括侧链中具有自由基反应基团的第一树脂、至少含有一个氟原子和一个硅原子的第二树脂以及溶剂。第二种树脂最好是含有氟原子的树脂。第一种树脂的自由基活性基团最好是（甲基）丙烯酰基。
• RESIN COMPOSITION FOR UNDERLAYER FILM FORMATION, LAYERED PRODUCT, METHOD FOR FORMING PATTERN, IMPRINT FORMING KIT, AND PROCESS FOR PRODUCING DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20170158905A1

  公开（公告）日：2017-06-08

  Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.
• US9612535B2
  申请人：——

  公开号：US9612535B2

  公开（公告）日：2017-04-04
• US9791777B2
  申请人：——

  公开号：US9791777B2

  公开（公告）日：2017-10-17