6-甲基双环[2.2.1]庚烷-6-羧酸 | 32508-22-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 中文名称: 6-甲基双环[2.2.1]庚烷-6-羧酸
• 中文别名: 2-甲基二环[2.2.1]庚烷-2-羧酸
• 英文名称: 2-Methyl-bicyclo[2.2.1]heptane-2-carboxylic acid
• 英文别名: 2-Methylbicyclo[2.2.1]heptane-2-carboxylic acid
• CAS: 32508-22-8
• 化学式: C₉H₁₄O₂
• 分子量: 154.209
• InChiKey: JZKREHRYLBOJRP-UHFFFAOYSA-N

物化性质

• 熔点：
  52-53 °C(Solv: acetonitrile (75-05-8))
• 沸点：
  150 °C(Press: 20 Torr)
• 密度：
  1.134±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  Methyl 2-methylnorbornan-2-carboxylate 生成 6-甲基双环[2.2.1]庚烷-6-羧酸
  参考文献：
  名称：

  ITSUMI, FUMIO

  摘要：

  DOI：

文献信息

• NOVEL COMPOUNDS AS CANNABINOID RECEPTOR LIGANDS
  申请人：Carroll William A.

  公开号：US20090018114A1

  公开（公告）日：2009-01-15

  The present application relates to cannabinoid receptor ligands containing compounds of formula (I) wherein A, R 1 , R 2 , and R 3 are as defined in the specification. The present application also relates to compositions comprising such compounds, and methods of treating conditions and disorders using such compounds and compositions.

  本申请涉及含有式(I)化合物的大麻素受体配体，其中A、R1、R2和R3如规范中所定义。本申请还涉及包含这种化合物的组合物，以及使用这种化合物和组合物治疗疾病和疾病的方法。
• BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120141938A1

  公开（公告）日：2012-06-07

  A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.

  一种化学放大型光刻胶组合物，包括基础聚合物、酸发生剂和胺淬灭剂，后者为β-丙氨酸、γ-氨基丁酸或5-氨基戊酸的衍生物，具有一个被酸不稳定基团所取代的羧基，这种组合物在曝光前后具有高对比度的碱性溶解速率，并且能够形成高分辨率、最小粗糙度和宽焦深度的良好图案轮廓。
• COMPOUNDS WHICH HAVE A PROTECTIVE ACTIVITY WITH RESPECT TO THE ACTION OF TOXINS AND OF VIRUSES WITH AN INTRACELLULAR MODE OF ACTION
  申请人：Commissariat A L'Energie Atomique Et Aux Energies Alternatives

  公开号：US20160083355A1

  公开（公告）日：2016-03-24

  The subject matter of the present invention is novel families of compounds which are aromatic amine, imine, aminoadamantane and benzodiazepine derivatives, medicaments comprising same and the use thereof as inhibitors of the toxic effects of toxins with intracellular activity, such as, for example, ricin, and of viruses that use the internalization pathway for infecting cells.

  本发明的主题是新型化合物家族，其中包括芳香胺、亚胺、氨基金刚烷和苯二氮卓衍生物，包括相同的药物和将其用作抑制具有细胞内活性的毒素（例如蓖麻毒素）以及利用内化途径感染细胞的病毒的药物。
• (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
  申请人：Maeda Katsumi

  公开号：US20070218403A1

  公开（公告）日：2007-09-20

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本文披露了一种光刻用220纳米或以下光的光阻材料，包括至少一种由以下式子（2）表示的聚合物和用于曝光生成酸的光酸发生剂： 其中，R1、R2、R3和R5分别是氢原子或甲基基团；R4是酸敏感基团、具有7至13个碳原子的脂环烃基团、具有酸敏感基团的7至13个碳原子的脂环烃基团、具有3至13个碳原子的环烃基团、具有环氧基团；R6是氢原子、具有1至12个碳原子的碳氢基团或具有7至13个碳原子的脂环烃基团，具有羧基；x、y和z是可选值，满足x+y+z=1，0
• (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT
  申请人：Maeda Katsumi

  公开号：US20110196122A1

  公开（公告）日：2011-08-11

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本文披露了一种光刻用于220nm或更低波长的光的光阻材料，其包括至少由以下化学式(2)表示的聚合物和用于曝光后生成酸的光酸发生剂：其中，R1、R2、R3和R5分别为氢原子或甲基基团；R4为酸敏感基团、具有7至13个碳原子的脂环烃基团，其具有酸敏感基团、具有7至13个碳原子的脂环烃基团，其具有羧基基团，或具有3至13个碳原子的碳氢基团，其具有环氧基团；R6为氢原子、具有1至12个碳原子的碳氢基团，或具有7至13个碳原子的脂环烃基团，其具有羧基基团；x、y和z是可选值，满足x+y+z=1，0