申请人:NISSAN CHEMICAL CORPORATION
公开号:US20220155686A1
公开(公告)日:2022-05-19
A composition for forming a resist underlayer film includes: (A) a cross-linking compound that is represented by formula (I); and (D) a solvent. [In formula (I), m is an integer from 1 to 30, T is a single bond, a saturated hydrocarbon group, an aromatic group, or an unsaturated cyclic hydrocarbon group, G
1
, G
2
, G
3
, G
4
, G
5
, and G
6
are each independently (i) or (ii), the n's are each independently an integer from 1 to 8, the n R's are each independently a hydrogen atom, an aliphatic hydrocarbon group, or an alicyclic hydrocarbon group, the A's are each independently an aryl group that may be interrupted by an alkylene group, and Z
1
, Z
2
, Z
3
, Z
4
, Z
5
, and Z
6
are each independently an alkyl group, an aryl group, a hydroxy group, an epoxy group, or a hydrogen atom.]