The present invention relates to compounds of formula (I): wherein R
1
is H, or a C
1
-C
10
linear, branched or cyclic alkyl group which is unsubstituted or substituted with fluorine; R
2
is an alicyclic group having 5 to 20 carbon atoms which is unsubstituted or substituted with fluorine; and R
3
represents a C
1
-C
10
linear or branched alkylene which is unsubstituted or substituted with fluorine. Processes for preparing such compounds are also disclosed. The compounds of the present invention can be used as monomers in the fields of photolithography and semiconductor fabrication.
本发明涉及式(I)的化合物:其中R1为H,或为未取代或取代
氟的C1-C10线性、支链或环烷基;R2为具有5到20个碳原子的脂环族基,其未取代或取代
氟;R3代表未取代或取代
氟的C1-C10线性或支链烷基。本发明还公开了制备这种化合物的方法。本发明的化合物可用作光刻和半导体制造领域的单体。