2-Hydroxy-6-methyl-4-oxatricyclo[4.2.1.03,7]nonan-5-one

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-Hydroxy-6-methyl-4-oxatricyclo[4.2.1.03,7]nonan-5-one
• 化学式: C₉H₁₂O₃
• 分子量: 168.19
• InChiKey: BWWRVZOZSYVWMF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.4
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• Salt suitable for an acid generator and a chemically amplified resist composition containing the same
  申请人：Yamaguchi Satoshi

  公开号：US20070122750A1

  公开（公告）日：2007-05-31

  The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Q 1 and Q 2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A + represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

  本发明提供了一种公式（I）的盐： 其中，环X代表具有3至30个碳原子的单环或多元环烃基团，并且单环或多元环烃基团中的一个或多个氢原子可被选地取代为具有1至10个碳原子的烷基、具有1至10个碳原子的烷氧基、具有1至4个碳原子的全氟烷基、具有1至10个碳原子的羟基烷基或腈基；Q1和Q2各自独立地代表氟原子或具有1至6个碳原子的全氟烷基；以及A+代表有机反离子。 本发明还提供了一种包含公式（I）的盐的化学放大抗蚀剂组合物。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：ICHIKAWA Koji

  公开号：US20100304294A1

  公开（公告）日：2010-12-02

  A salt represented by the formula (I-AA): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X 1 represents a single bond etc., Y 1 represents a C1-C36 aliphatic hydrocarbon group etc., A 1 and A 2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar 1 represents a (m 4 +1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B 1 represents a single bond etc., m 1 and m 2 independently each represents an integer of 0 to 2, m 3 represents an integer of 1 to 3, with the proviso that m 1 plus m 2 plus m 3 equals 3, and m 4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

  公式(I-AA)表示的盐，其中Q1和Q2各自独立代表一个氟原子或一个C1-C4全氟烷基团，X1代表一个单一键等，Y1代表一个C1-C36脂肪烃团等，A1和A2各自独立代表一个C1-C20脂肪烃团等，Ar1代表一个(m4+1)价的C6-C20芳香烃团，该团可以有一个或多个取代基，B1代表一个单一键等，m1和m2各自独立代表一个从0到2的整数，m3代表一个从1到3的整数，条件是m1加上m2加上m3等于3，m4代表一个从1到3的整数，以及包含由公式(I-AA)表示的盐的光阻剂组合物，以及包含具有酸不稳定基团且在碱性水溶液中不溶或微溶但在酸作用下变得可溶的结构单元的树脂。
• ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Kinsho Takeshi

  公开号：US20100304295A1

  公开（公告）日：2010-12-02

  An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R 2 is H or monovalent hydrocarbon, R 3 and R 4 are H or monovalent hydrocarbon, or R 3 and R 4 , taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.

  一种酸敏感酯单体具有螺环结构，其化学式如下（1），其中Z是具有可聚合双键的一价基团，X是形成环戊烷、环己烷或诺邦烷环的二价基团，R2是H或一价碳氢基团，R3和R4是H或一价碳氢基团，或者R3和R4一起表示形成环戊烷或环己烷环的二价基团，n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性，因此可以用于制备具有高分辨率的抗蚀组合物。
• Chemical amplification type resist composition
  申请人：Yamada Airi

  公开号：US20080269506A1

  公开（公告）日：2008-10-30

  The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

  本发明提供了一种公式(Ia)的硫鎓盐，包括一个结构单元的聚合物化合物的公式(Ib)，以及一种化学放大型正性光刻胶组合物，包括(A)至少选择自硫鎓盐的公式(Ia)、一个结构单元的聚合物化合物的公式(Ib)和硫鎓盐的公式(Ic)组成的酸发生剂；以及(B)含有酸敏感基团的结构单元的树脂，本身在碱性水溶液中不溶或难溶，但在酸的作用下变得可溶于碱性水溶液。
• (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
  申请人：Maeda Katsumi

  公开号：US20090023878A1

  公开（公告）日：2009-01-22

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  这里披露了一种用于光刻制程的光波长为220nm或更低的光阻材料，其中包括至少由以下式子（2）表示的聚合物和用于曝光生成酸的光酸发生剂： 式中，R1、R2、R3和R5均为氢原子或甲基基团；R4为酸敏基团、具有酸敏基团的7至13个碳原子的脂环烃基团、具有羧基的7至13个碳原子的脂环烃基团或具有环氧基的3至13个碳原子的烃基团；R6为氢原子、具有1至12个碳原子的烃基团或具有羧基的7至13个碳原子的脂环烃基团；x、y和z为可选值，满足x+y+z=1，0树脂： 式中，R8为氢原子或甲基基团，R9为具有脂环内酯结构的7至16个碳原子的烃基团。