5-(3-iodopropyl)dihydro-2(3H)-furanone | 404003-36-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 5-(3-iodopropyl)dihydro-2(3H)-furanone
• 英文别名: dihydro-5-(3'-iodopropyl)-2(3H)-furanone；2(3H)-Furanone, dihydro-5-(3-iodopropyl)-；5-(3-iodopropyl)oxolan-2-one
• CAS: 404003-36-7
• 化学式: C₇H₁₁IO₂
• 分子量: 254.068
• InChiKey: KDSXLXVATNIWFZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  10
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  三苯基膦 、 5-(3-iodopropyl)dihydro-2(3H)-furanone 以 甲苯 为溶剂， 反应 5.0h， 以72%的产率得到[3-(5'-oxotetrahydro-2'-furyl)propyl]triphenylphosphonium iodide
  参考文献：
  名称：

  Intramolecular acylative ring-switching reactions of 3-(tetrahydro-2′-furyl)propanoic acid derivatives to give butanolides: mechanism and scope

  摘要：

  当3-(四氢-2′-呋喃基)丙酸-三氟乙酸混合酐在酸催化剂的作用下生成二氢-5-(3′-三氟乙酰氧基丙基)-2(3H)-呋喃酮的机制被定义，并描述了一些潜在有用的丁内酯合成体的合成途径。

  DOI：

  10.1039/b301329b
• 作为产物：
  描述：

  3-(fur-2-yl)crotonic acid 在 10percent Pd/C 氢气 、 三氟乙酸酐 、 sodium iodide 作用下， 以 乙酸乙酯 、 丙酮 为溶剂， 反应 4.5h， 生成 5-(3-iodopropyl)dihydro-2(3H)-furanone
  参考文献：
  名称：

  Intramolecular acylative ring-switching reactions of 3-(tetrahydro-2′-furyl)propanoic acid derivatives to give butanolides: mechanism and scope

  摘要：

  当3-(四氢-2′-呋喃基)丙酸-三氟乙酸混合酐在酸催化剂的作用下生成二氢-5-(3′-三氟乙酰氧基丙基)-2(3H)-呋喃酮的机制被定义，并描述了一些潜在有用的丁内酯合成体的合成途径。

  DOI：

  10.1039/b301329b

文献信息

• Investigation of Bis(tributyltin)-Initiated Free Radical Cyclization Reactions of 4-Pentenyl Iodoacetates
  作者：Junhua Wang、Chaozhong Li

  DOI：10.1021/jo0109568

  日期：2002.2.1

  free radical cyclization to generate gamma-iodoheptanolactones which easily underwent intramolecular nucleophilic substitution to form bicyclic acylium species (7) as the key intermediate. Subsequent attack by iodide ion furnished gamma-lactones while attack by hydroxide ion gave the tetrahydrofuran derivatives.

  4-戊烯基碘乙酸酯（1）在80摄氏度下的双（三丁基锡）引发的原子转移环化反应导致高产率形成5-（3-碘丙基）-取代的二氢-2（3H）-呋喃酮（3） 。以BF3 * Et2O为催化剂，反应在室温下进行，得到相应的γ-碘庚庚醇内酯（2），经水处理可进一步转化为3-（四氢-2-呋喃基）丙酸（6）。碳酸氢钠 推测该反应机理是8-内基自由基环化以生成γ-碘庚庚醇内酯，其容易经历分子内亲核取代以形成双环基物种（7）作为关键中间体。随后被碘离子侵蚀而产生的γ-内酯，而被氢氧根离子侵蚀得到了四氢呋喃衍生物。
• Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2628745B1

  公开（公告）日：2015-03-25
• THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20200159120A1

  公开（公告）日：2020-05-21

  The present invention is a thermosetting silicon-containing material containing one or more of a repeating unit shown by the following general formula (Sx-1), a repeating unit shown by the following general formula (Sx-2), and a partial structure shown by the following general formula (Sx-3): where R 1 represents an iodine-containing organic group; and R 2 and R 3 are each independently identical to R 1 , a hydrogen atom, or a monovalent organic group having 1 to 30 carbon atoms. This provides: a thermosetting silicon-containing material used for forming a resist underlayer film which is capable of contributing to sensitivity enhancement of an upper layer resist while keeping LWR thereof from degrading; a composition for forming a silicon-containing resist underlayer film, the composition containing the thermosetting silicon-containing material; and a patterning process using the composition.
• THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20200216670A1

  公开（公告）日：2020-07-09

  A thermosetting silicon-containing compound contains one or more of structural units shown by the following general formulae (Sx-1), (Sx-2), and (Sx-3): where R 1 represents a monovalent organic group containing both a phenyl group optionally having a substituent and a non-aromatic ring having 3 to 10 carbon atoms; and R 2 , R 3 each represent the R 1 or a monovalent organic group having 1 to 30 carbon atoms. Thus, the present invention provides a thermosetting silicon-containing compound usable in a silicon-containing resist underlayer film material capable of achieving contradictory properties of having both alkaline developer resistance and improved solubility in an alkaline stripping liquid containing no hydrogen peroxide.
• METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20200340806A1

  公开（公告）日：2020-10-29

  A method for measuring a distance of diffusion of a curing catalyst for a thermosetting silicon-containing material includes the steps of: forming a silicon-containing film from a composition containing a thermosetting silicon-containing material, a curing catalyst and a solvent; coating the silicon-containing film with a photosensitive resin composition containing a resin whose solubility in alkaline developer is increased by the action of an acid, an acid generator and a solvent, and subsequently heating to prepare a substrate on which the silicon-containing film and a resin film are formed; irradiating the substrate with a high energy beam or an electron beam to generate an acid and heat-treating the substrate to increase the solubility of the resin in an alkaline developer by the action of the acid in the resin film; dissolving the resin film in an alkaline developer; and measuring a film thickness of the remaining resin.