endo-2-Cyanobicyclo[2.2.1]heptane | 3211-87-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: endo-2-Cyanobicyclo[2.2.1]heptane
• 英文别名: (2R)-bicyclo[2.2.1]heptane-2-carbonitrile
• CAS: 3211-87-8
• 化学式: C₈H₁₁N
• 分子量: 121.18
• InChiKey: GAHKEUUHTHVKEA-RRQHEKLDSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  9
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  23.8
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
  申请人：Fujifilm Corporation

  公开号：EP1795960A2

  公开（公告）日：2007-06-13

  A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.

  一种正抗蚀剂组合物包括：(A) 在酸的作用下，其在碱显影剂中的溶解度增加的树脂；(B) 在光射线或辐射照射下能够产生酸的化合物；(C) 具有至少一个氟原子和一个硅原子的树脂；以及 (D) 溶剂；以及使用正抗蚀剂组合物的图案形成方法。
• Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition
  申请人：FUJIFILM Corporation

  公开号：EP1816519A1

  公开（公告）日：2007-08-08

  A photosensitive composition, which comprises a compound represented by formula (I): wherein R1 to R13 each independently represents a hydrogen atom or a substituent, and at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X- represents a counter anion; and a pattern-forming method using the photosensitive composition.

  一种光敏组合物，由式 (I) 所代表的化合物组成： 其中 R1 至 R13 各自独立地代表氢原子或取代基，且 R1 至 R13 中至少有一个是含有醇羟基的取代基；Z 代表单键或二价连接基团；X- 代表反阴离子；以及使用该光敏组合物的图案形成方法。
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONNEMENTS OU SENSIBLE AUX RAYONS ACTINIQUES, ET FILM SENSIBLE AUX RAYONNEMENTS OU SENSIBLE AUX RAYONS ACTINIQUES, ET PROCÉDÉ DE FORMATION DE MOTIF, CHACUN DE CEUX-CI UTILISANT LADITE COMPOSITION
  申请人：FUJIFILM CORP

  公开号：WO2013100158A1

  公开（公告）日：2013-07-04

  An actinic ray-sensitive or radiation-sensitive resin composition, which is excellent in sensitivity, resolution, a pattern profile and a depth of focus (DOF), and, an actinic ray-sensitive or radiation-sensitive film and a pattern forming method, each using the same, are provided. The actinic ray-sensitive or radiation-sensitive resin composition includes a nitrogen-containing compound and a resin (Ab) capable of varying a polarity or an alkali solubility thereof by the action of an acid.