9,9-bis(4-trifluoromethanesulfonyloxyphenyl)fluorene | 218769-04-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 芴
• 英文名称: 9,9-bis(4-trifluoromethanesulfonyloxyphenyl)fluorene
• 英文别名: 4,4'-(9-fluorenylidene)bis(phenyltriflate)；9,9-bis[4-(trifluoromethylsulfonyloxy)phenyl]fluorene；Bis(trifluoromethanesulfonic acid)9H-fluorene-9-ylidenebis(4,1-phenylene) ester；[4-[9-[4-(trifluoromethylsulfonyloxy)phenyl]fluoren-9-yl]phenyl] trifluoromethanesulfonate
• CAS: 218769-04-1
• 化学式: C₂₇H₁₆F₆O₆S₂
• 分子量: 614.543
• InChiKey: SCBQTWWLTJODAB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.2
• 重原子数：
  41
• 可旋转键数：
  6
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  104
• 氢给体数：
  0
• 氢受体数：
  12

反应信息

• 作为反应物：
  描述：

  9,9-bis(4-trifluoromethanesulfonyloxyphenyl)fluorene 在 四(三苯基膦)钯 、 1,1'-双(二苯膦基)二茂铁二氯化钯(II)二氯甲烷复合物 、 potassium acetate 、 sodium carbonate 作用下， 以 1,4-二氧六环 、 甲苯 为溶剂， 生成
  参考文献：
  名称：

  플루오렌 디아민 화합물 및 이로부터 유도된 구조단위를 포함하는 폴리이미드 수지

  摘要：

  本公开涉及一种新型的氟烯二胺化合物、及其衍生单元所制备的聚酰亚胺树脂和聚酰亚胺薄膜。根据本公开的一个实施例，聚酰亚胺薄膜通过包含源自氟烯二胺化合物的衍生单元，显著改善了薄膜的黄色度。因此，根据本公开一个实施例的聚酰亚胺薄膜具有优异的光学特性，可以有效地应用于光学设备，如显示装置。

  公开号：

  KR20240020798A
• 作为产物：
  描述：

  三氟甲磺酸酐 、 双酚芴 在 吡啶 作用下， 以 二氯甲烷 为溶剂， 反应 0.17h， 以98.4%的产率得到9,9-bis(4-trifluoromethanesulfonyloxyphenyl)fluorene
  参考文献：
  名称：

  通过芳基三氟甲磺酸与二苯膦的钯催化的P-C偶联，方便地合成四芳基phosph聚电解质

  摘要：

  通过二苯膦和双（三氟甲磺酸芳基酯）的聚合，成功地合成了一系列八种四芳基phosph聚电解质（TPEL）。双（芳基三氟甲磺酸酯）很容易从双酚制备，其中一些是商品原料，例如双酚A。通过钯催化的P–C键形成的聚合反应可产生高达65的聚合度。 350–450°C的范围。TPEL对碱性溶液的稳定性在很大程度上取决于相邻phospho位点之间的间隔基。与电子释放和笨重的取代基的聚合物对位-对鏻站点具有改善的稳定性，而那些具有吸电子取代基对-phospho位点由于通过亲核芳香族取代途径分解而降低了碱稳定性。这些发现对于碱性交换膜燃料电池和相关的电化学能量转换装置的离聚物设计具有重要的意义。©2017 Wiley Periodicals，Inc. J. Polym。科学，A部分：Polym。化学 2017年，55，1984-1990

  DOI：

  10.1002/pola.28564

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Design and Synthesis of New Polymeric Materials for Organic Nonvolatile Electrical Bistable Storage Devices:  Poly(biphenylmethylene)s
  作者：Matthias Beinhoff、Luisa D. Bozano、J. Campbell Scott、Kenneth R. Carter

  DOI：10.1021/ma049572k

  日期：2005.5.1

  The synthesis of new polymers, poly(biphenylmethylene)s, derived from bistriflates of bisphenol-type monomers, by Ni(0)-mediated polymerization has been presented. These polymers are interesting because of the nature of the polymer backbone that contains biphenyl units separated by substituted methylene units. The solubility, mechanical properties, and electrical properties of the polymers can be altered

  The synthesis of new polymers, poly(biphenylmethylene)s, derived from bistriflates of bisphenol-type monomers, by Ni(0)-mediated polymerization has been presented. These polymers are interesting because of the nature of the polymer backbone that contains biphenyl units separated by substituted methylene units. The solubility, mechanical properties, and electrical properties of the polymers can be altered
• Composition for film formation and material for insulating film formation
  申请人：JSR CORPORATION

  公开号：US20020172652A1

  公开（公告）日：2002-11-21

  A composition for film formation capable of forming a coating film excellent in low dielectric constant characteristics, cracking resistance, modulus of elasticity, and adhesion to substrates and useful as an interlayer insulating film material in semiconductor devices, etc. The composition for film formation contains (A) at least one member selected from an aromatic polyarylene and an aromatic poly (arylene ether), (B) a polyvinylsiloxane, and (C) an organic solvent.

  一种用于制备薄膜的组合物，能够形成具有低介电常数特性、抗开裂性、弹性模量和对基底的附着力优异的涂层膜，并可用作半导体器件中的层间绝缘膜材料等。该制膜组合物包含（A）至少一种选自芳香族聚芳烃和芳香族聚（芳烃醚）的成员，（B）聚乙烯基硅氧烷和（C）有机溶剂。
• Nickel‐Catalyzed Reductive C−Ge Coupling of Aryl/Alkenyl Electrophiles with Chlorogermanes
  作者：Pei‐Feng Su、Ke Wang、Xuejing Peng、Xiaobo Pang、Peng Guo、Xing‐Zhong Shu

  DOI：10.1002/anie.202112876

  日期：2021.12.13

  A new C−Ge bond-forming framework was established, which bridges a gap between a recently developed mild coupling technique and organogermane chemistry. The method provides a mild approach for the synthesis of both aryl and alkenyl germanes, with improved molecular diversity and structural complexity, using readily available carbon electrophiles and chlorogermanes as starting materials.

  建立了一种新的 C−Ge 键形成框架，它弥合了最近开发的温和耦合技术和有机锗烷化学之间的差距。该方法为芳基和烯基锗烷的合成提供了一种温和的方法，具有改进的分子多样性和结构复杂性，使用容易获得的碳亲电子试剂和氯锗烷作为起始材料。
• Diyne-containing (co) polymer, processes for producing the same, and cured film
  申请人：JSR Corporation

  公开号：EP1099719A1

  公开（公告）日：2001-05-16

  A diyne-containing (co)polymer which is soluble in organic solvents, has excellent processability, and gives a cured coating film excellent in heat resistance, solvent resistance, low-dielectric characteristics, and mechanical strength; processes for producing the same; and a cured film. The diyne-containing (co)polymer contains at least 10 mol% repeating units represented by the following formula (1) and has a weight-average molecular weight of from 500 to 1,000,000: wherein Y represents a specific bivalent organic group; Ar represents a bivalent organic group; and n represents 0 or 1.

  一种可溶于有机溶剂、加工性能优异、固化涂膜的耐热性、耐溶剂性、低介电特性和机械强度优异的含二炔（共）聚合物；生产该聚合物的工艺；以及固化涂膜。 含二炔（共）聚合物含有至少 10 摩尔%的重复单元，由下式（1）表示，其重量平均分子量为 500 至 1,000,000 之间： 其中 Y 代表特定的二价有机基团；Ar 代表二价有机基团；n 代表 0 或 1。