Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition
申请人:FUJIFILM Corporation
公开号:EP1903395A1
公开(公告)日:2008-03-26
A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.
一种正性光敏组合物包括:一种聚合物化合物,该聚合物化合物的一个末端具有可酸分解的结构;以及一种化合物,该化合物能够在光射线或辐射照射时产生一种酸。