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dihydro-4,4,5-trimethyl-2(3H)-furanone | 150927-33-6

中文名称
——
中文别名
——
英文名称
dihydro-4,4,5-trimethyl-2(3H)-furanone
英文别名
4,4,5-trimethyldihydrofuran-2(3H)-one;3,3-Dimethylpentan-4-olid;3,3-Dimethyl-4-pentanolacton;4,4,5-trimethyl-dihydro-furan-2-one;4,4,5-Trimethyl-dihydro-furan-2-on;4,4,5-Trimethyloxolan-2-one
dihydro-4,4,5-trimethyl-2(3H)-furanone化学式
CAS
150927-33-6
化学式
C7H12O2
mdl
MFCD08274907
分子量
128.171
InChiKey
LPLUNGXZFNJJBZ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.4
  • 重原子数:
    9
  • 可旋转键数:
    0
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.857
  • 拓扑面积:
    26.3
  • 氢给体数:
    0
  • 氢受体数:
    2

反应信息

  • 作为产物:
    描述:
    3,3-二甲基-4-戊烯酸europium(III) trifluoromethanesulfonate 作用下, 以 氯苯 为溶剂, 反应 7.0h, 以70%的产率得到dihydro-4,4,5-trimethyl-2(3H)-furanone
    参考文献:
    名称:
    铕催化的羧酸与未活化烯烃的分子内加成:制备芳基取代的 γ-丁内酯的有效途径
    摘要:
    三氟甲磺酸铕 (III) 已被证明是芳基取代羧酸分子内环化生成芳基化 γ-丁内酯的有效催化剂。各种吸引人的特点,如广泛的底物范围、广泛的官能团耐受性、操作简单、完整的原子经济性和良好的产量,使这个新协议更具吸引力。此外,该方法为现有催化剂提供了实用的替代方案。
    DOI:
    10.1055/s-0040-1707820
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文献信息

  • 3-PYRIMIDIN-4-YL-OXAZOLIDIN-2-ONES AS INHIBITORS OF MUTANT IDH
    申请人:VESTAS WIND SYSTEMS A/S
    公开号:US20140235620A1
    公开(公告)日:2014-08-21
    The invention is directed to a compound of formula (I) or a pharmaceutically acceptable salt thereof, wherein R 1 -R 6 are defined herein. The invention is also directed to compositions containing a compound of formula (I) and to the use of such compounds in the inhibition of mutant IDH proteins having a neomorphic activity. The invention is further directed to the use of a compound of formula (I) in the treatment of diseases or disorders associated with such mutant IDH proteins including, but not limited to, cell-proliferation disorders, such as cancer.
    该发明涉及公式(I)的化合物或其药用盐,其中R1-R6在此处定义。该发明还涉及含有公式(I)化合物的组合物,以及利用这些化合物抑制具有新型活性的突变IDH蛋白。该发明还涉及利用公式(I)的化合物治疗与这些突变IDH蛋白相关的疾病或紊乱,包括但不限于细胞增殖紊乱,如癌症。
  • Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
    申请人:KATO Misugi
    公开号:US20120322006A1
    公开(公告)日:2012-12-20
    A sulfonate resin according to the present invention has a repeating unit of the following general formula (3): where X each independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R represents a hydrogen atom, a halogen atom or a C 1 -C 3 alkyl or fluorine-containing alkyl group; J represents a divalent linking group; and M + represents a monovalent cation. This sulfonate resin contains a sulfonic acid onium salt in a side chain thereof, with an anion moiety of the sulfonic acid onium salt fixed to the sulfonate resin, and thus functions as a resist resin with good resist characteristics such as DOF, LER, sensitivity and resolution.
    根据本发明,磺酸盐树脂具有以下通用公式(3)的重复单元:其中X分别表示氢原子或氟原子;n表示1至10的整数;R表示氢原子、卤原子或C1-C3烷基或含氟烷基团;J表示二价连接基团;M+表示一价阳离子。这种磺酸盐树脂在侧链中含有磺酸盐鉮盐,磺酸盐鉮盐的阴离子部分固定在磺酸盐树脂上,因此作为具有良好抗性特性(如DOF、LER、灵敏度和分辨率)的抗性树脂。
  • Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
    申请人:MORI Kazunori
    公开号:US20130065182A1
    公开(公告)日:2013-03-14
    According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.
    根据本发明,提供了一种含氟磺酸盐重复单元为以下通式(3)的树脂。为了防止图案形成后的粗糙度或图案形成失败等不足,该含氟磺酸盐树脂具有光酸发生功能,并作为一种抗蚀树脂,其中“能够通过酸作用改变其显影剂溶解性的基团”和“具有光酸发生功能的基团”有规律地排列。
  • Polymerizable Fluorine-Containing Compound
    申请人:ISONO Yoshimi
    公开号:US20110098500A1
    公开(公告)日:2011-04-28
    A polymerizable fluorine-containing compound represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 2 represents an acid-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 2 , R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.
    一种可聚合的含氟化合物,其化学式为(1),其中R1表示可聚合的双键含有基团,R2表示酸敏感保护基团,R3表示氟原子或含氟烷基团,W表示二价连接基团。该化合物可以提供一种含氟聚合物化合物,其重均分子量为1,000-1,000,000,并包含由式(2)表示的重复单元,其中R2、R3和W如上所述,R4、R5和R6中的每一个独立地表示氢原子、氟原子或一价有机基团,至少两个R4、R5和R6可以结合形成一个环。该聚合物化合物可以提供一种抗蚀剂组合物,能够形成透明的曝光光线图案,并具有优异的矩形度。
  • Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same
    申请人:ISONO Yoshimi
    公开号:US20120226070A1
    公开(公告)日:2012-09-06
    A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
    化学式(1)所表示的含氟不饱和羧酸,其中R1代表可聚合的双键含基团,R3代表氟原子或含氟烷基团,W代表二价连接基团。该化合物可提供一种分子量为1,000-1,000,000且含有化学式(2)所表示的重复单元的含氟聚合物化合物,其中R3和W如上所定义,R4、R5和R6中的每一个独立地代表氢原子、氟原子或一价有机基团,R4、R5和R6中至少有两个可以结合形成环。该聚合物化合物可提供一种化学增强型光刻胶组合物,该组合物对KrF或ArF准分子激光光线透明,具有高分辨率,并能够形成具有矩形截面且无膨胀的图案。
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