The present invention relates to a diblock copolymer that may facilitate formation of a finer nano pattern, and be used for manufacture of an electronic device including a nano pattern or a bio sensor, and the like, a method for preparing the same, and a method for forming a nano pattern using the same,
The diblock copolymer comprises a hard segment including at least one specific acrylamide-based repeat unit, and a soft segment including at least one (meth)acrylate-based repeat unit.
本发明涉及一种二嵌段共聚物,可促进更细的纳米图案形成,并用于制造包括纳米图案或
生物传感器等电子设备,以及其制备方法和使用该共聚物形成纳米图案的方法。该二嵌段共聚物包括一个硬段,其中包括至少一个特定的
丙烯酰胺基重复单元,以及一个软段,其中包括至少一个(甲基)
丙烯酸酯基重复单元。